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Sensitivity enhancement device and method for four-wavefront transverse shear interference wavefront sensor

A technology of wavefront sensor and transverse shearing, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve problems such as spectrum leakage and periodic oscillation errors, and achieve the effect of improving sensitivity

Active Publication Date: 2019-06-14
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the relative sensitivity value σ is greater than 1 in most areas, when u=m / s, v=n / s, (m, n∈N), the corresponding relative sensitivity is zero, and the relative sensitivity of the area near the zero point will be is less than 1, these positions cause periodic oscillation errors in the reconstructed wavefront due to spectral leakage effects

Method used

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  • Sensitivity enhancement device and method for four-wavefront transverse shear interference wavefront sensor
  • Sensitivity enhancement device and method for four-wavefront transverse shear interference wavefront sensor
  • Sensitivity enhancement device and method for four-wavefront transverse shear interference wavefront sensor

Examples

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Embodiment 1

[0045] An example of the application of the present invention to the high-sensitivity measurement of the text etching depth of the phase plate is described as follows:

[0046] figure 2 It is the optical path layout diagram of the sensitivity enhancement device of the four-wavefront transverse shear interference wavefront sensor to detect the etching depth of the phase plate characters. The DUT of the embodiment is the etched letter "S" on the phase plate. A He-Ne laser with a wavelength of 623.8nm is used. Laser A1 emits laser light that passes through pinhole filter A2 and collimator lens A3 to produce parallel light with uniform brightness, passes through the component under test A4, passes through the objective lens A5 and eyepiece A6, and then splits the beam through the beam splitter S1, and transmits all the way into the first The four-wavefront transverse shear interference wavefront sensor S2 is diffracted by a random-coded hybrid grating with a grating period of 3...

Embodiment 2

[0052] An example of the application of the present invention to high-sensitivity quantitative phase microscopy of human red blood cells is described below:

[0053] Figure 10 It is an optical path layout diagram of a four-wavefront transverse shear interference wavefront sensor sensitivity enhancement device used in quantitative phase microscopy of human red blood cells. The component under test B7 in the embodiment is a human blood smear, and the system uses an LED light source with a center wavelength of 623 nm and a full width at half maximum of 18 nm. The LED light source B1 passes through the pinhole filter B2 and the collimator lens B3 to produce parallel light with uniform brightness, and then the light beam enters the condenser lens B6 after passing through the reflector B4 and the lens B5. Place the human blood smear B7 at the focus position of the condenser lens B6 and the microscope objective lens B8, after the light beam passes through the human blood smear B7, ...

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Abstract

The invention discloses a sensitivity enhancing device and method for four-wavefront lateral shear interference wavefront sensors. On the basis of a single four-wavefront lateral shear interference wavefront sensor, after a to-be-detected light beam is divided into two beams, a four-wavefront lateral shear interference wavefront sensor is added, the distances from gratings to detectors in the two wavefront sensors are respectively adjusted to enable corresponding shear rate combinations to meet a sensitivity enhancing condition, and high-resolution-ratio and high-sensitivity detection by using a Fourier transform phase reconstruction technology under the condition of large shear rate is realized. The sensitivity enhancing device and method for four-wavefront lateral shear interference wavefront sensors have the advantages that the problem of periodic oscillation existing in a demodulated wavefront phase due to a spectrum leakage when the Fourier transform phase reconstruction technology under the condition of large shear rate is used by the traditional four-wavefront lateral shear interference system is solved, the regions where the relative sensitivity is zero are eliminated by the combined shear rate, periodic missing information in a frequency spectrum is supplemented, and compared with the traditional interferometer, the device has the characteristic that the measurement sensitivity is improved.

Description

technical field [0001] The invention relates to a sensitivity enhancement device and method of a four-wavefront transverse shear interference wavefront sensor. Background technique [0002] Interference microscopy reconstructs the wavefront difference, surface shape, defect and other information of the component under test by detecting the wavefront distortion after the beam passes through the component under test. Traditional methods include digital holographic microscopy, diffraction phase microscopy, etc. These technologies are based on Mach-Zehnder interferometer or point diffraction interferometry. While the detection accuracy of the Mach-Zehnder interferometer largely depends on the quality of the reference plate, the detection accuracy of the point diffraction interferometer is related to the quality of the pinhole. In addition, the detection device of the traditional method is often very large, and it is not easy to calibrate the beam. The four-wavefront transverse...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B9/02
CPCG01B9/02055
Inventor 杨甬英张锐江佳斌凌曈
Owner ZHEJIANG UNIV
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