A beta-hemihydrate gypsum retarder and a preparing method thereof
A technology of hemihydrate gypsum and retarder, which is applied in the field of building materials, can solve the problems of complex preparation process, high production cost, single effect of retarder, etc., and achieve the effect of simple preparation process, low cost and small loss of strength
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0021] Manganese slag is dried and ground to make manganese slag powder (specific surface area 458m 2 / kg); mix 6 parts of zeolite (200 mesh), 7 parts of manganese slag powder, and 1 part of slag portland cement to obtain retarder.
[0022] 92 parts of β-hemihydrate gypsum and 8 parts of retarder are made into a mixture with a water-to-material ratio of 0.60, molded, and tested for setting time and strength properties.
Embodiment 2
[0024] Dry and grind 4 parts of manganese slag, 5 parts of steel slag and 3 parts of slag to make metallurgical slag powder (specific surface area 458m 2 / kg); Mix 2 parts of zeolite (300 mesh), 4 parts of metallurgical slag powder, and 2 parts of ordinary Portland cement to obtain retarder.
[0025] 94 parts of β-hemihydrate gypsum and 6 parts of retarder are made into a mixture with a water-to-material ratio of 0.61, molded, and tested for setting time and strength properties.
Embodiment 3
[0027] 86 parts of β-hemihydrate gypsum and 14 parts of the retarder obtained in Example 2 were made into a mixture with a water-to-material ratio of 0.59, molded, and tested for setting time and strength properties.
PUM
Property | Measurement | Unit |
---|---|---|
specific surface area | aaaaa | aaaaa |
specific surface area | aaaaa | aaaaa |
specific surface area | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com