Groove type SOI LIGBT comprising carrier storage layer

A carrier storage and trench gate technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of sweeping out the drift region, large turn-off loss, long turn-off time, etc., to reduce the on-voltage drop, High withstand voltage, the effect of maintaining withstand voltage

Active Publication Date: 2017-07-04
UNIV OF ELECTRONICS SCI & TECH OF CHINA +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the LIGBT is turned off, a large number of unbalanced electron-hole pairs stored in the drift region need to be extracted. These carriers are far away from the withstand voltage PN junction formed by the P-type body region and t

Method used

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  • Groove type SOI LIGBT comprising carrier storage layer
  • Groove type SOI LIGBT comprising carrier storage layer
  • Groove type SOI LIGBT comprising carrier storage layer

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Embodiment Construction

[0019] Such as figure 1 As shown, it is a three-dimensional structural schematic diagram of the device of the present invention, combined with figure 2 , image 3 and Figure 4 It can be obtained that, compared with the traditional device structure, the device of the present invention has a high-concentration carrier storage layer and a dielectric groove.

[0020] The working principle of the present invention is: when the forward conduction is conducted, the PN junction of the anode is opened, and holes are injected into the drift region, and the holes pass through the drift region to reach the carrier storage layer, and are blocked by the carrier storage layer. According to the characteristic principle, more electrons are injected into the drift region, and the conductance modulation effect is enhanced, thereby reducing the forward conduction voltage drop of the device. At the same time, a dielectric groove is introduced to physically prevent holes from being collected b...

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Abstract

The invention belongs to the field of power semiconductor technology and relates to a groove type SOI LIGBT comprising a carrier storage layer. The groove type SOI LIGBT relative to a structure in the prior art comprises the following characteristics: 1, the groove type SOI LIGBT comprises the carrier storage layer in high concentration which blocks a hole in forward conduction, the concentration of the hole near an interface is increased, according to an electroneutrality principle, more electrons is injected to a drift region, the conductivity modulation effect is enhanced, and the forward conduction voltage drop of a device is reduced, simultaneously, a medium groove is introduced, the medium groove physically block a cathode to collect the hole and acts on further reduction of forward conduction voltage drop, and more importantly, the medium groove can assistant to drain the carrier storage layer in forward blocking, so that the device maintains high pressure resistance in the condition of high concentration carrier storage layer; 2. the groove type SOI LIGBT adopts tri-gate structure, and the channel density is improved; 3. tri-gate structure and the medium groove can be manufactured simultaneously without extra processing steps.

Description

technical field [0001] The invention belongs to the technical field of power semiconductors, and relates to a slot-type SOI LIGBT with a carrier storage layer. Background technique [0002] LIGBT is a structure composed of lateral field effect transistors and bipolar transistors. It has the advantages of high input impedance of field effect transistors, low control power, simple driving circuit, high current density of bipolar transistors, and low saturation voltage. . SOI LIGBT is compatible with standard CMOS circuits and is widely used in high-voltage integrated circuits, and its SOI substrate can play a role of complete dielectric isolation. [0003] The current density capability of high-voltage LIGBT has a great influence on the driving capability, so increasing its current density capability becomes the key to improving chip performance and reducing chip cost. The high current capability of LIGBT stems from the conductance modulation effect in its drift region. By i...

Claims

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Application Information

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IPC IPC(8): H01L29/739
CPCH01L29/7394
Inventor 罗小蓉孙涛黄琳华邓高强刘庆魏杰欧阳东法周坤张波
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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