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High and low temperature general polysiloxane phosphonate doped SPEEK proton exchange membrane and preparation method thereof

A technology of proton exchange membrane and polysiloxane, which is applied in the direction of fuel cells, electrochemical generators, electrical components, etc., can solve the problems of less research on proton exchange membranes, and achieve good mechanical strength, thermal stability, and good swelling degree of effect

Inactive Publication Date: 2017-08-29
WUHAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are few researches on proton exchange membranes suitable for both high and low temperature.

Method used

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  • High and low temperature general polysiloxane phosphonate doped SPEEK proton exchange membrane and preparation method thereof
  • High and low temperature general polysiloxane phosphonate doped SPEEK proton exchange membrane and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A polysiloxane polyphosphonic acid doped SPEEK high and low temperature universal proton exchange membrane, which is prepared according to the following steps:

[0026] At room temperature, weigh 4.0 g of dried PEEK powder (molecular weight: 30,000-40,000) and dissolve it in 30 mL of concentrated sulfuric acid (concentration >98%), then keep stirring at room temperature for 192 hours to fully react the PEEK powder with concentrated sulfuric acid. Then the reaction solution is slowly poured into a beaker filled with ice-water mixture, and the SPEEK product is separated out, and the degree of sulfonation of the product obtained by acid-base titration is about 63%; 2.5102g 2-(3,4- Epoxycyclohexyl)ethyltrimethoxysilane (EHTMS) and 0.7476g aminotrimethylene phosphonic acid (ATMP) (silicon, phosphorus molar ratio is 4.0:3.0), and they were dissolved in 10mL DMSO Prepare siloxane solution and organic polyphosphonic acid solution; then transfer the organic polyphosphonic acid s...

Embodiment 2

[0028] A polysiloxane polyphosphonic acid doped SPEEK high and low temperature universal proton exchange membrane, which is prepared according to the following steps:

[0029]At room temperature, weigh 4.0 g of dried PEEK powder (molecular weight: 30,000-40,000) and dissolve it in 30 mL of concentrated sulfuric acid (concentration >98%), then keep stirring at room temperature for 192 hours to fully react the PEEK powder with concentrated sulfuric acid. Then the reaction solution is slowly poured into a beaker filled with ice-water mixture, and the SPEEK product is separated out, and the degree of sulfonation of the product obtained by acid-base titration is about 63%; 2.5102g 2-(3,4- Epoxycyclohexyl) ethyltrimethoxysilane (EHTMS) and 0.9967g aminotrimethylene phosphonic acid (ATMP) (silicon, phosphorus molar ratio is 1.0:1.0), and they were dissolved in 10mL DMSO Prepare siloxane solution and organic polyphosphonic acid solution; then transfer the organic polyphosphonic acid s...

Embodiment 3

[0031] A polysiloxane polyphosphonic acid doped SPEEK high and low temperature universal proton exchange membrane, which is prepared according to the following steps:

[0032] At room temperature, weigh 4.0 g of dried PEEK powder (molecular weight: 30,000-40,000) and dissolve it in 30 mL of concentrated sulfuric acid (concentration >98%), then keep stirring at room temperature for 192 hours to fully react the PEEK powder with concentrated sulfuric acid. Then the reaction solution is slowly poured into a beaker filled with ice-water mixture, and the SPEEK product is separated out, and the degree of sulfonation of the product obtained by acid-base titration is about 63%; 2.5102g 2-(3,4- Epoxycyclohexyl)ethyltrimethoxysilane (EHTMS) and 0.7476g aminotrimethylene phosphonic acid (ATMP) (silicon, phosphorus molar ratio is 4.0:3.0), and they were dissolved in 10mL DMSO Prepare siloxane solution and organic polyphosphonic acid solution; then transfer the organic polyphosphonic acid s...

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Abstract

The invention provides a high and low temperature general polysiloxane phosphonate doped SPEEK proton exchange membrane and a preparation method of the proton exchange membrane. The proton exchange membrane is prepared by performing cross-linking in an SPEEK matrix to form polysiloxane phosphonate doped SPEEK collosol after a ring-opening reaction of organic phosphonic acid and siloxane, and performing ageing, drying and heat treatment on the collosol. According to the proton exchange membrane, protons are conducted by proton conduction units with different ingredients at different temperatures and humidity, so that the membrane can exert good proton conductivity at the medium and low temperature and the high temperature and low humidity, and even under an anhydrous condition. The prepared membrane has good mechanical property and thermochemistry stability and effectively reduces methanol transmittance at the same time.

Description

technical field [0001] The invention belongs to the technical field of fuel cell manufacturing, and in particular relates to a polysiloxane polyphosphonic acid-doped sulfonated polyetheretherketone (SPEEK) high-low temperature universal proton exchange membrane and a preparation method thereof. Background technique [0002] The perfluorosulfonic acid proton exchange membrane with better comprehensive performance at low temperature, because its proton conduction mechanism is that protons and water molecules form hydrated protons, and the hydrated protons diffuse through the hydrophilic region and are transported from one side of the membrane to the other. This proton conduction mechanism is highly dependent on the presence of liquid water, and at high temperatures (>100°C), its proton conductivity drops dramatically as the liquid water evaporates. In order to obtain higher high-temperature proton conductivity, it is necessary to research and develop new proton exchange mem...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01M8/1048H01M8/1069
CPCH01M8/1048H01M8/1069H01M2008/1095Y02E60/50
Inventor 沈春晖任学超高山俊陈继钦袁园
Owner WUHAN UNIV OF TECH
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