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Cylindrical sintered body, cylindrical sputtering target, and method for producing the same

A technology of composition and resist, which is applied in the field of display devices, can solve problems such as difficulty in ensuring the performance of photoresist stripper, increased process loss, and high volatilization, and achieves the effect of excellent cumulative processing sheet number characteristics

Active Publication Date: 2017-10-10
DONGWOO FINE CHEM CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, some glycol ethers with a low boiling point have a large amount of volatilization in the process, so the process loss (Loss) will increase. Since acetates can react with organic amines and alkali compounds that are the basic components of the stripping agent, Therefore, it is difficult to ensure the performance of the photoresist stripper

Method used

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  • Cylindrical sintered body, cylindrical sputtering target, and method for producing the same
  • Cylindrical sintered body, cylindrical sputtering target, and method for producing the same
  • Cylindrical sintered body, cylindrical sputtering target, and method for producing the same

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Effect test

Embodiment 1～14 and comparative example 1

[0087] Examples 1-14 and Comparative Examples 1-4: Manufacture of resist stripping liquid composition

[0088] The components of the content described in following Table 1 were mixed, and the resist stripping liquid composition was manufactured.

[0089] [Table 1] (unit: weight %)

[0090]

[0091] BEEM: bis(2-ethoxyethoxy)methane

[0092] BMEM: bis(2-methoxyethoxy)methane

[0093] BBEM: bis(2-butoxyethoxy)methane

[0094] TDME: Triethylene glycol dimethyl ether

[0095] MEDG: Diethylene glycol methyl ether

[0096] DGA: diglycolamine

[0097] MEA: Monoethanolamine

[0098] HEP: Hydroxyethylpiperazine

[0099] TMAH: Tetramethylammonium Hydroxide

[0100] NMP: N-Methylpyrrolidone

[0101] THFA: tetrahydrofurfuryl alcohol

[0102] EDG: Diethylene glycol monoethyl ether

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Abstract

It is an object of the present invention to provide a cylindrical sintered body, a cylindrical sputtering target, and a method for producing the same in a cylindrical axis direction of 470 mm or more. A method of manufacturing a cylindrical sputtering target according to an embodiment of the present invention is a method of manufacturing a cylindrical sputtering target having a cylindrical sintered body in which a cylinder having a cylinder length of 600 mm or more The shaped body is disposed on a pedestal provided with an oxygen supply port connected to a pipe for oxygen supply and is provided on a pedestal having a length slightly smaller than an inner circumference of the cylinder provided inside the cylinder of the cylindrical molded body Cylinder axis direction of oxygen at the same time sintering. In another embodiment, it is also possible to arrange the pedestal in the chamber, and the piping for oxygen supply is connected from the outside of the chamber to the oxygen supply port.

Description

technical field [0001] The present invention relates to a resist stripping solution composition, a method for producing a flat panel for a display device using the stripping solution, a flat panel for a display device manufactured using the same, and a display device including the flat panel. Background technique [0002] As the demand for high-resolution representation of flat panel display devices has increased in recent years, efforts to increase the number of pixels per unit area are continuing. In response to such a trend, the reduction of the wiring width is also required, and in order to meet these requirements, a dry etching process is introduced, and the process conditions are becoming more and more severe. [0003] In addition, due to the increase in the size of flat panel display devices, the signal speed in wiring is also required to be increased, so copper, which has a lower resistivity than aluminum, has been put into practical use as a wiring material. Accord...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/425G03F7/42C07C43/04C07C43/164G09F9/30
Inventor 高京俊金正铉崔汉永
Owner DONGWOO FINE CHEM CO LTD
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