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Acid jet etching method and acid jet etching device for fused silica optical element

A technology for optical components and etching devices, which is applied in the field of acid jet etching methods and acid jet etching devices, and can solve problems such as the inability to control the surface shape of components and the inability to perform fixed-point etching in local areas by hydrofluoric acid etching methods. Achieve the effects of inhibiting surface contamination, improving roughness index deterioration, and reducing acid consumption

Active Publication Date: 2020-07-24
成都精密光学工程研究中心
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is that the current hydrofluoric acid etching method cannot perform fixed-point etching in local areas and cannot control the element surface shape during the etching process. The purpose is to provide an acid jet etching method for fused silica optical elements and Acid jet etching device, the hydrofluoric acid liquid is pressurized by the acid-resistant water pump, transported through the pipeline, mixed with the polishing liquid at the nozzle, and the high-pressure mixed liquid is sprayed out through the nozzle at the front of the nozzle to form a jet liquid column that acts on the molten metal. On the surface of quartz components, realize fixed-point etching in local areas, and control the surface shape of components during the etching process

Method used

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  • Acid jet etching method and acid jet etching device for fused silica optical element
  • Acid jet etching method and acid jet etching device for fused silica optical element

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Embodiment 1

[0038] Such as Figure 1-2 As shown, the present invention includes an acid jet etching device for fused silica optical elements, comprising

[0039] Acid transport unit 1: including peristaltic pump and acid tank or pneumatic diaphragm pump and acid tank, using peristaltic pump or pneumatic diaphragm pump to continuously extract hydrofluoric acid when working in parallel, and transport acid tank through acid-resistant hose The hydrofluoric acid solution in the spray head mixing chamber 11;

[0040] Stirring and mixing unit 2: It includes a detachable liquid storage tank and an electric stirring rod. The liquid storage tank is used to store the polishing liquid containing abrasive particles. It is connected to the polishing liquid transportation unit through a fixed interface. Inside the barrel, it is used to stir the polishing liquid to prevent the natural sedimentation and aggregation of polishing abrasive particles and ensure the normal transportation of the polishing liqu...

Embodiment 2

[0046] This embodiment is preferably as follows on the basis of Embodiment 1: it also includes a motion and positioning unit 5 for clamping the polishing head to ensure that the nozzle can move accurately and continuously in three-dimensional space according to the preset motion trajectory. It further improves the precise fixed-point etching of the local area of ​​the fused silica material.

Embodiment 3

[0048] The present embodiment is preferably as follows on the basis of the foregoing embodiments: it also includes a recovery circulation unit: including a working tank 6-1, a recovery pump, an acid-base neutralization chamber 6-2 and a filtering device 6-3, and the filtering device is installed between the recovery pump and the filtering device. Between the liquid storage tanks, the working tank collects the jet mixed solution sprayed out by the nozzle, enters the acid-base neutralization chamber to remove the acid components, and then enters the filter device to filter out impurity particles, and then sends it back to the liquid storage tank through the recovery pump. The acid-base neutralization chamber is designed in the polishing liquid recovery unit to realize the removal of residual hydrofluoric acid in the recovered polishing liquid.

[0049] The acid liquid is transported to the nozzle by the acid liquid transport unit, and the polishing liquid is extracted from the st...

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Abstract

The invention discloses an acid jetting etching method for a fused quartz optical element and an acid jetting etching device. The acid jetting etching device comprises an acid liquor conveying unit, a stirring mixing unit, a polishing solution conveying unit and a sprayer. The method comprises the following steps: soaking the fused quartz optical element in a hydrofluoric acid dilute solution in specific concentration for 5-10min and removing the surface pollutants and polishing a re-settled layer; setting etching parameters according to position, scope and depth information of defects and surface data and surface roughness result of the element and then editing and generating a code of motion track of the sprayer; starting the acid jetting etching device and performing acid jetting etching processing according to a program instruction; ultrasonically cleaning, removing the polishing grains and hydrofluoric acid remained on the surface, adopting an optical microscope, an optical interferometer and an optical contourgraph for measuring the defects of the element, the surface shape and the surface roughness again and repeating the steps till reaching the standard if the results do not reach the standard. The principle according to the invention is adopted for realizing the fixed point etching in local area and controlling the element surface shape in the etching process.

Description

technical field [0001] The invention relates to the field of optical manufacturing and optical material processing, in particular to an acid jet etching method and an acid jet etching device for fused silica optical elements. Background technique [0002] Laser damage of fused silica components is an important bottleneck restricting the output power of high-power laser devices. Most of the laser damage occurs on the surface of the component, and the surface and subsurface defects of the material and the absorbing impurities attached to the surface are considered to be important factors that lead to the reduction of the laser damage threshold of the fused silica component. The generation of surface and subsurface defects of fused silica components is closely related to the polishing process. The hard impurities and debris involved in the polishing disc are easily pressed into the surface of fused silica components during the pressurized rotation of the polishing disc, forming...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C15/02C03C15/00
CPCC03C15/00C03C15/02
Inventor 吕亮马平鄢定尧朱衡黄金勇蒲云体蔡超王刚张明骁
Owner 成都精密光学工程研究中心