Method for preparing nanowire of stannous sulfide/silicon oxide core-shell structure
A technology of stannous sulfide and silicon oxide, which is applied in the field of core-shell structure nanowires, can solve the problems of complex process of stannous sulfide nanowires and unfavorable large-scale production, and achieve good application prospects, easy promotion and operation, and low environmental pollution small effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0033] The invention provides a method for preparing a stannous sulfide / silicon oxide core-shell nanowire, comprising:
[0034] Put stannous sulfide powder in the central temperature zone of the high-temperature tube furnace, place silicon wafers downstream of the stannous sulfide powder airflow, vacuumize the high-temperature tube furnace cavity, and then pass in airflow to restore the high-temperature tube furnace cavity to normal Press and heat to obtain tin sulfide / silicon oxide core-shell nanowires.
[0035] The present invention has no special limitation on the source of the stannous sulfide powder, and the commercially obtained stannous sulfide block can be ground by a grinding method well known to those skilled in the art to obtain the stannous sulfide powder.
[0036] In the present invention, the purity of the stannous sulfide (powder) is preferably above 99.0%, more preferably above 99.5%, most preferably 99.01%, 99.1%, 99.5%, 99.9%, 99.99%, 99.995%, 99.998% %, 99....
Embodiment 1
[0048] Clean the silicon wafer;
[0049] Commercially purchased block-shaped stannous sulfide is fully ground into powder, weighs 0.25g of stannous sulfide powder with a purity of 99.5%, puts it into a ceramic boat, puts the ceramic boat into the central temperature zone of a high-temperature tube furnace, and Place the above-mentioned cleaned silicon wafers at the downstream of the airflow at 17 cm from the central temperature zone (the positions of the airflow, the central temperature zone and the silicon wafers are as follows: Figure 5 shown); the high-temperature tube furnace is vacuumized, and then 60 sccm of Ar gas flow is introduced into the furnace to restore the tube furnace to normal pressure, and the tube furnace is heated to 900 ° C for 3 hours, then naturally cooled, and the A tin sulfide / silicon oxide core-shell structure nanowire is obtained on the surface of the silicon chip.
[0050] Carry out XRD diffraction experiment to the stannous sulfide / silicon oxide ...
Embodiment 2
[0055] Clean the silicon wafer;
[0056] Commercially purchased block-shaped stannous sulfide is fully ground into powder, weighs 0.2g of stannous sulfide powder with a purity of 99.8%, puts it into a ceramic boat, and puts the ceramic boat into the central temperature zone of a high-temperature tube furnace. Place the above-mentioned cleaned silicon wafers (the positions of the airflow, the central temperature zone and the silicon wafers such as Figure 5 shown); the high-temperature tube furnace is vacuumized, and then 70 sccm of Ar gas flow is introduced into the furnace to return the tube furnace to normal pressure, and the tube furnace is heated to 950 ° C for 2 hours, and then naturally cooled. A tin sulfide / silicon oxide core-shell structure nanowire is obtained on the surface of the silicon chip.
PUM
| Property | Measurement | Unit |
|---|---|---|
| diameter | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| energy conversion efficiency | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com



