A high-hardness wear-resistant glass cover plate and a preparing method thereof
A wear-resistant glass, high-hardness technology, applied in the coating and other directions, can solve the problems of easy scratching, low glass hardness, large surface roughness, etc.
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[0042] The present invention also provides a method for preparing a high-hardness wear-resistant glass cover plate, comprising the following steps:
[0043] A) Si is used as the target material, and Ar gas and O are introduced 2 , Magnetron sputtering was performed on the glass substrate under vacuum conditions to obtain coated SiO 2 Layered glass substrate;
[0044] B) Graphite is used as the target material, and Ar gas and H are introduced 2 , coated with SiO under vacuum conditions 2 Magnetron sputtering is performed on the glass of the layer to obtain a glass substrate coated with a hydrogen-containing DLC layer;
[0045] C) Using Si-graphite as the composite target, injecting Ar gas and H 2 , magnetron sputtering is carried out on the glass substrate coated with the hydrogen-containing DLC layer under vacuum conditions to obtain a high-hardness wear-resistant glass cover plate.
[0046] In the present invention, the glass substrate is preferably cleaned first by ...
Embodiment 1
[0054] The surface of the glass substrate is cleaned by dedusting and degreasing to obtain a clean coating surface. Put the substrate into the chamber of the magnetron sputtering equipment, and carry out vacuum treatment. 2 The flow rate is 45sccm, the coating pressure is 6.5mTorr, the silicon target power is 1500W, the coating voltage is about 320V, and the coating time is 30s to prepare SiO 2 The transition layer has a thickness of 4-8nm. Then transfer the sample to another vacuum chamber to coat a hydrogen-containing DLC film layer, the vacuum degree is 3.0-6.0E-6mTorr, and the Ar gas flow rate is 30sccm, H 2 The gas flow is 12sccm, the C target power is 6.0KW, the coating pressure is 3.5mTorr, the coating voltage is 720V, the coating time is 30s, and the thickness is 5-10nm. Then, Si-DLC is deposited in a vacuum chamber with a silicon-carbon composite target as a sputtering target, the vacuum degree is 3.0-6.0E-6mTorr, and the Ar gas flow rate is 30 sccm, H 2 The gas ...
Embodiment 2
[0061] The surface of the glass substrate is cleaned by dedusting and degreasing to obtain a clean coating surface. Put the substrate into the chamber of the magnetron sputtering equipment, and carry out vacuum treatment. 2 The flow rate is 45sccm, the coating pressure is 6.5mTorr, the silicon target power is 1500W, the coating voltage is about 320V, and the coating time is 30s to prepare SiO 2 The transition layer has a thickness of 4-8nm. Then transfer the sample to another vacuum chamber to coat a hydrogen-containing DLC film layer, the vacuum degree is 3.0-6.0E-6mTorr, and the Ar gas flow rate is 30sccm, H 2 The gas flow is 12sccm, the C target power is 8.0KW, the coating pressure is 3.5mTorr, the coating voltage is 780V, the coating time is 30s, and the thickness is 8-15nm. Then, Si-DLC is deposited in a vacuum chamber with a silicon-carbon composite target as a sputtering target, the vacuum degree is 3.0-6.0E-6mTorr, and the Ar gas flow rate is 30 sccm, H 2 The gas ...
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