Preparation method of novel and green mono-dispersive silicon dioxide nanospheres
A technology of silica and nanospheres, applied in the field of nanomaterials, can solve the problems of difficulty in obtaining high-quality SiO2 nanospheres, poor controllability and repeatability of silica nanospheres, and restrictions on popularization and application, and achieve uniform appearance , the system can be reused, and the follow-up processing is simple
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0042] (1) Mix 4 g of secondary ultrapure water with 76 g of ethanol, add 20 g of dichloromethane under stirring conditions, and continue stirring for 10 min after the addition is complete.
[0043] (2) Slowly add 1.3ml tetraethyl orthosilicate into the O / W type surfactant-free microemulsion system obtained in step (1) under stirring. After the addition is completed, sonicate for 10 minutes and stir for 20 minutes.
[0044] (3) Move the O / W type surfactant-free microemulsion system containing tetraethyl orthosilicate obtained in step (2) into an ice-water bath, and slowly add 3ml of ammonia water (25wt%) into it under stirring conditions, and continue stirring for 10min Afterwards, the reaction device was moved into a water bath at 25° C. for 24 hours of static reaction.
[0045] (4) After the reaction is over, a white solid is obtained by centrifugation, and the white solid is washed 3 times to obtain SiO 2 nanospheres. The remaining liquid components were distilled to coll...
Embodiment 2
[0047] (1) Mix 4 g of secondary ultrapure water with 36 g of ethanol, add 10 g of dichloromethane under stirring conditions, and continue stirring for 10 min after the addition is complete.
[0048] (2) Slowly add 1.3ml tetraethyl orthosilicate into the O / W type surfactant-free microemulsion system obtained in step (1) under stirring. After the addition is completed, sonicate for 10 minutes and stir for 20 minutes.
[0049] (3) Move the O / W type surfactant-free microemulsion system containing tetraethyl orthosilicate obtained in step (2) into an ice-water bath, and slowly add 3ml of ammonia water (25wt%) into it under stirring conditions, and continue stirring for 10min Afterwards, the reaction device was moved into a water bath at 25° C. for 24 hours of static reaction.
[0050] (4) After the reaction is over, a white solid is obtained by centrifugation, and the white solid is washed 3 times to obtain SiO 2 nanospheres. The remaining liquid components were distilled to coll...
Embodiment 3
[0052] (1) Mix 4 g of secondary ultrapure water with 16 g of ethanol, add 5 g of dichloromethane under stirring conditions, and continue stirring for 10 min after the addition is complete.
[0053] (2) Slowly add 1.3ml tetraethyl orthosilicate into the O / W type surfactant-free microemulsion system obtained in step (1) under stirring. After the addition is completed, sonicate for 10 minutes and stir for 20 minutes.
[0054] (3) Move the O / W type surfactant-free microemulsion system containing tetraethyl orthosilicate obtained in step (2) into an ice-water bath, and slowly add 3ml of ammonia water (25wt%) into it under stirring conditions, and continue stirring for 10min Afterwards, the reaction device was moved into a water bath at 25° C. for 24 hours of static reaction.
[0055] (4) After the reaction is over, a white solid is obtained by centrifugation, and the white solid is washed 3 times to obtain SiO 2 nanospheres. The remaining liquid components were distilled to colle...
PUM
Property | Measurement | Unit |
---|---|---|
particle diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com