Reflection-type AlGaAs photocathode with quantum efficiency at wavelength of 532nm being improved, and preparation method
A quantum efficiency, photocathode technology, applied in the manufacture of light-emitting cathodes, cathode ray tubes/electron beam tubes, circuits, etc., can solve problems such as low quantum efficiency, difficulty in adapting to target detection, identification and confirmation, and low photocathode absorption rate , to achieve the effect of improving quantum efficiency, improving quantum efficiency and reducing reflectivity
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[0028] The structure diagram of the reflective AlGaAs photocathode improving the quantum efficiency at the wavelength of 532nm in the present invention is as follows figure 1 shown. The reflective AlGaAs photocathode assembly consists of GaAs substrate layer 1, buffer layer 2 of distributed Bragg mirror structure, Al x3 Ga 1-x3 As emitter layer 3 and Cs / O active layer 4 composition.
[0029] The logarithm of the buffer layer (2) of the distributed Bragg reflector structure is 10 to 30 pairs; in the buffer layer (2) of the distributed Bragg reflector structure, Al x1 Ga 1-x1 The thickness of the As layer is 40-50nm, and the Al x2 Ga 1-x2 The thickness of the As layer is 30-40nm; the Al x3 Ga 1-x3 The thickness of the As emission layer (3) is 300-600nm; Al x3 Ga 1-x3 Al composition x of As emission layer (3) 3 Satisfy 0.5≤x 3 ≤0.7, for example, a reflective AlGaAs photocathode with the following parameters can be prepared:
[0030] (1) On the high-quality n-type GaAs...
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