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A nanohole array holder suitable for flexible substrates

A technology of nano-hole array and flexible substrate, which is applied in the field of wafer stage, can solve problems such as unsuitable flexible substrate, and achieve the effects of eliminating bad phenomena, strong adsorption force, and eliminating the uneven deformation of the substrate.

Active Publication Date: 2020-04-10
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Abstract
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  • Claims
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Problems solved by technology

[0003] The purpose of the present invention is a nanohole array vacuum adsorption carrier, which mainly solves the defect that the traditional carrier is only suitable for hard substrates and not suitable for flexible substrates

Method used

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  • A nanohole array holder suitable for flexible substrates
  • A nanohole array holder suitable for flexible substrates

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Embodiment Construction

[0017] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0018] The implementation plan is attached figure 1 , the nano-array hole substrate includes a chassis 1 , a positioning plate 2 , an anodized aluminum hole substrate 3 , a substrate 4 , an air flow plate 5 , an L-shaped adapter 6 , and an air pipe 7 . The bottom of the chassis 1 is in contact with the airflow plate 5, and the airflow plate 5 guides the gas from the airflow channel to the bottom surface of the anodized aluminum hole substrate 3, and the diversion groove designed on the bottom surface 3 of the anodized aluminum hole substrate can evenly distribute the incoming gas to the entire plane, so that the entire substrate is evenly stressed and the stress is reduced. The positioning plate 2 is installed on the chassis 1 by screw connection, the airflow plate 5 is installed on the plane of the chassis 1, and the anodized aluminum hole sub...

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Abstract

The invention discloses a nanopore array substrate bearing table for a flexible substrate. The nanopore array substrate bearing table is characterized in that a core part is an anode aluminum oxide pore base plate; nanometer-level air pores are uniformly distributed in the surface of the anode aluminum oxide pore base plate, and are communicated with an air flow disc; after the air flow disc is engaged with an air source, the whole anode aluminum oxide pore base plate is uniformly distributed with the air flow; during light exposure and laminating with a mask plate, the air pressure of the airsource is increased, so that the substrate is disengaged from the anode aluminum oxide pore base plate, the mask plate is extruded, and the air floatation light exposure is realized, thereby effectively improving the light exposure accuracy. The nanopore array substrate bearing table has the advantages that in the light exposure process, the temperature in the working area is increased; the flatting accuracy is increased within certain temperature increasing range, and the defects of torsion and deformation of the substrate, distortion of pictures and the like are overcome; the problems of nonuniform stress on the substrate and large internal stress are solved.

Description

technical field [0001] The present invention relates to the technical field of film holders, in particular to a nanohole array film holder suitable for flexible substrates, in particular to a film holder for exposure of air-floated substrates. Background technique [0002] Compared with traditional electronic and optical devices, flexible electronic and optical devices have the characteristics of thinner, lighter, lower power consumption, better portability, bendability, and good adhesion to soft tissues, so they have become a new generation of electronic and optical devices. research hotspots. Therefore, the processing and detection of micro-nano structures on the surface of flexible substrates is the key to the rapid development of flexible electronics and optical devices. However, in traditional semiconductor equipment, aluminum or steel ring-shaped adsorption grooves and hole structures are mostly used in the wafer carrier. Due to the limitation of machining accuracy, i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70716
Inventor 罗先刚蒲明博高平马晓亮薛磊
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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