Multi-gap pseudospark electron beam source capable of suppressing flashover

Abstract

The invention discloses a multi-gap pseudospark electron beam source capable of suppressing flashover. The multi-gap pseudospark electron beam source capable of suppressing flashover comprises a blindflange, a ceramic isolation sleeve and a through hole flange which are connected in sequence, hollow electrodes which are symmetrically placed at two ends inside the ceramic isolation sleeve and insulation sleeves thereof, and middle electrode and middle insulation plates which are alternatively superposed in the ceramic isolation sleeve. the hollow electrodes located at the two ends, the insulation sleeves thereof and the middle electrodes located in the middle for electron beam focusing and acceleration form a discharging cavity. A multi-gap pseudospark electron beam source capable of suppressing flashover can be acquired and a high-energy electron beam can be obtained. The multi-gap pseudospark electron beam source effectively suppresses abnormal discharge in a pseudospark discharge process through protecting the edge of a metal pole plate and cutting and hindering formation of flashover along the surface, the energy of the electron beam is improved, and the discharge stability andthe reliability are improved.

Description

technical field [0001] The invention relates to a technology in the field of pseudo-spark discharge, in particular to a multi-gap pseudo-spark electron beam source capable of suppressing arc flash. Background technique [0002] Pseudo-spark discharge is a gas low-pressure discharge located in the left half of the Paschen curve. The discharge pressure is generally tens to hundreds of millitorr. As the gas pressure decreases, the breakdown voltage will rise rapidly. [0003] There are five phases of pseudospark discharge, starting from the hollow cathode discharge phase where the electron beam is generated. The pulsed electron beam generated by pseudospark discharge has the characteristics of high beam current density, high energy density, high brightness, and self-focusing. Therefore, the pseudospark electron beam has a good application prospect in the surface modification of materials, X-ray generation, thin film preparation, and high-frequency microwave generation. [00...

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Problems solved by technology

However, under high voltage, the distorted electric field at the edge of the metal pole piece, the arc flash along the surface of the isolation insulating sheet, etc. will easily lead to abnormal breakdown, and the electron beam cannot be generated.

[0005] Abnormal discharge phenomena such as arc along the surface seriously affect the stability and reliability of the pseudo-spark electron beam source, limit the further improvement of the electron beam performance, and also reduce the service life of the pseudo-spark electron beam source, and even cause the discharge cavity damage to

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