A kind of preparation method of n-type heterojunction double-sided solar cell
A solar cell and heterojunction technology, applied in the field of solar cells, can solve the problems of increased light absorption of the P-type doped amorphous silicon layer, affecting the development of N-type heterojunction double-sided cells, and reducing the effective bandgap width. Achieve good field passivation effect, good surface passivation effect, and reduce uniformity requirements
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[0037] The preparation method of the N-type heterojunction bifacial solar cell proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific examples. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0038] Please refer to Figure 2-Figure 3 ,Such as Figure 2-Figure 3 As shown, the embodiment of the present invention provides a method for preparing an N-type heterojunction double-sided solar cell, comprising the following steps:
[0039] S1: providing an N-type silicon wafer substrate 200;
[0040] S2: Perform double-sided texturing on the N-type silicon wafer substrate 200; specifically: put the N-type silicon wafer substrate 2...
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