LIV effect adjustable lanthanum-calcium-manganese-oxygen thin film preparation equipment

Abstract

The invention discloses LIV effect adjustable lanthanum-calcium-manganese-oxygen thin film preparation equipment. The LIV effect adjustable lanthanum-calcium-manganese-oxygen thin film preparation equipment comprises a cabinet body, a laser generator, a vacuum system, an atmosphere system, a target material system, a thin film system, a shoot plating system, a magnetic control system, a film thickness testing system and an LIV performance adjusting system. According to the LIV effect adjustable lanthanum-calcium-manganese-oxygen thin film preparation equipment, the controllability of the thinfilm quality can be greatly improved, thus the film thickness is controllable, and a large-area application-type thin film can be prepared by enlarging the magnetic field range; preparation of the multi-component thin film can be conducted by switching materials in real time, it is ensured that preparation conditions are the same, and the thin film of different states can be prepared under same adjustment; and a real-time testing function is achieved, the film thickness of the thin film and the LIV effect performance can be monitored in real time, the technological adjusting period can be greatly shortened, the work procedure conditions can be adjusted in time to prepare samples meeting the requirement, the raw material utilization rate is increased, and the development cost is reduced.

Description

technical field [0001] The invention relates to a lanthanum-calcium-manganese-oxygen film preparation equipment with adjustable LIV effect, belonging to the technical field of film preparation. Background technique [0002] With the rapid development of the national economy, the proportion of the industrial economic index in the gross national economic output is constantly increasing, and the country's emphasis on the manufacturing industry is also increasing. Among them, high-precision production has become the core development goal. In high-precision production, high-sensitivity devices have become an indispensable core component. Most of the high-sensitivity devices need to be adjustable, miniaturized, and suitable for high working conditions. This series of properties makes the industry turn its attention to the field of thin film materials. Thin film materials not only have the above properties and characteristics, but also have the characteristics of multi-attribute...

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Problems solved by technology

However, the current lanthanum-calcium-manganese-oxygen thin film preparation equipment has the following common problems: (1) Most of them use the process principle of falling gravity after radio frequency pulverization, which makes the quality of the prepared film uneven, such as easy to produce bumps, etc. And the film thickness cannot be well controlled, and secondly, it is impossible to prepare large-area applied thin films; (2) Most of the current devices can only prepare single-component thin films, and cannot switch between different targets for multi-component thin films. , first to slow down the efficiency, and second, if the preparation is performed in stages, the conditions cannot be guaranteed to be the same, and the process uncertainty will be increased. At the same time, the existing equipment cannot switch to prepare films in different states under the same conditions; (3) the current Most of the devices only have the function of preparation and do not have the function of testing, and it is impossible to shorten the process adjustment cycle and adjust the process conditions in time to prepare samples that meet the requirements through real-time testing, so it is easy to cause waste of raw materials and increase development costs

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