Resin, slurry, laminate obtained using the same, and method for producing the same
A slurry and resin technology, applied in the field of laminates, can solve the problems of step yield deterioration and equipment reliability, and achieve good capacity retention, low warpage, and high bonding effects
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Embodiment 1
[0210] Under a dry nitrogen stream, 10.6 g (0.04 mol: 40 mol %) of o-toluene diisocyanate, 3.48 g (0.02 mol: 20 mol %) of 2,4-toluene diisocyanate, and 4,4' - 10.0 g (0.04 mol: 40 mol %) of diphenylmethane diisocyanate was dissolved in 120 g of N-methyl-2-pyrrolidone (NMP). To this, 19.2 g (0.1 mol: 100 mol %) of trimellitic anhydride and NMP 17.9 g were added as an acid component, reacted at 120° C. for 2 hours, and reacted at 140° C. for 2 hours to obtain a resin with a resin concentration of 20%. Composition 1.
Embodiment 2~9、14
[0211] Embodiment 2~9,14, comparative example 1 and 2
[0212] Compositions 2 to 9 and 14 to 16 having a resin concentration of 20% were obtained by the same method as in Example 1 using the amine components and acid components shown in Table 1.
Embodiment 10
[0214] Under a dry nitrogen stream, 18.5 g (0.07 mol: 70 mol %) of ortho-toluene diisocyanate and 5.22 g (0.03 mol: 30 mol %) of 2,4-toluene diisocyanate were dissolved in 120 g of NMP as amine components. To this, 0.871 g (0.01 mol: 10 mol %) of 2-butanone oxime and NMP 10 g were added as an end-capping agent, and reacted for 2 hours at 70° C., and further, 18.3 g (0.095 Mole: 95 mol%) and NMP8.12g were reacted at 120° C. for 2 hours and 140° C. for 2 hours to obtain a composition 10 with a resin concentration of 20%.
PUM
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