High-covering high-luminance quantum dot diffusion barrier and preparation method and application thereof

A quantum dot and diffusion film technology, applied in the field of quantum dot diffusion film, can solve the problems of general light uniformity and large luminance loss of quantum dot backlight diffusion plate, and achieve large luminance loss, good atomization and covering effect, The effect of good luminance performance

Inactive Publication Date: 2018-08-10
NINGBO EXCITON TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to solve the problems of large luminance loss and general light uniformity of the current quantum dot backlight diffusion plat

Method used

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  • High-covering high-luminance quantum dot diffusion barrier and preparation method and application thereof
  • High-covering high-luminance quantum dot diffusion barrier and preparation method and application thereof
  • High-covering high-luminance quantum dot diffusion barrier and preparation method and application thereof

Examples

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preparation example Construction

[0082] The preparation method of quantum dot film provided by the invention, described method comprises the following steps:

[0083] (1) Add fumed silica particles, titanium dioxide particles and silica particles into the adhesive and stir at high speed for 30 minutes to obtain a pre-dispersion of particles;

[0084] (2) adding red and green quantum dots to the pre-dispersion of the above particles and stirring at high speed for 30 minutes to obtain a quantum dot coating solution;

[0085] (3) Coating with a slot die automatic coating machine, coating the quantum dot coating liquid on the release surface of the release film, and extruding it with another release film through the slot die The release surface of the film is bonded, and the quantum dot composite film with three layers of film bonded is obtained by curing with ultraviolet light curing equipment;

[0086] (4) The two release films are peeled off, and the solidified quantum dot adhesive layer is obtained through t...

Embodiment 1

[0103] The present invention provides a quantum dot diffusion film with high coverage and high luminance. The quantum dot diffusion film includes a quantum dot substrate layer and a diffusion layer, and the diffusion layer is coated on the upper and lower surfaces of the quantum dot substrate layer; The quantum dot substrate layer is a single-layer film structure.

[0104] The quantum dot substrate layer comprises 100 parts by weight of polyester resin; 2 parts by weight of red quantum dots; 6 parts by weight of green quantum dots; 1 part by weight of fumed silica particles, the fumed silica particles The particle size distribution is 10-20nm; 5 parts by weight of titanium dioxide particles, the particle size of the titanium dioxide particles is 0.3 μm; 10 parts by weight of large particle size silicon dioxide particles, the particle size of the large particle size silicon dioxide The diameter is 2 μm; the thickness of the quantum dot substrate layer is 100 μm, and the quantum...

Embodiment 2

[0107] For the high-covering and high-brightness quantum dot diffusion film provided in Example 1, the quantum dot substrate layer includes 100 parts by weight of polyester resin, 2 parts by weight of red quantum dots, and 6 parts by weight of green quantum dots, 1 part by weight of fumed silicon dioxide particles, 5 parts by weight of titanium dioxide particles, and 10 parts by weight of large-diameter silicon dioxide particles, the thickness of the quantum dot substrate layer is 300 μm.

[0108] The diffusion layer includes 100 parts by weight of adhesive, 40 parts by weight of organic diffusion particles, and 10 parts by weight of inorganic diffusion particles, and the thickness of the diffusion layer is 5 μm.

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Abstract

The invention relates to a high-covering high-luminance quantum dot diffusion barrier and a preparation method and application thereof, belongs to the field of optical films, and aims at overcoming the problem that a present quantum dot backlight diffuser plate is high in luminance loss and general in dodging capability. A quantum dot film is combined with a diffusion barrier, The quantum dot diffusion barrier comprises a quantum dot substrate layer of a single-layer film structure and diffusion layers coating the upper and lower surfaces of the substrate layer. The quantum dot can provide a higher luminance of a backlight module, the diffusion layer can play a light diffusion angle correction role, light of a light source is refracted, reflected or scattered in the surfaces when passing diffusion particles on the diffusion film, light of a backlight source is spread flexibly and uniformly, and the problem that the quantum dot backlight module is not uniform in light emission at present is solved.

Description

technical field [0001] The invention relates to the field of optical thin films, in particular to a quantum dot diffusion film. Background technique [0002] Liquid crystal display (LCD), as the most common display technology today, has been widely used in the display screens of TVs, computers, mobile phones, and some instruments. One of the most important display devices. [0003] In recent years, people have begun to pursue a more extreme visual experience, and the application of quantum dot liquid crystal display technology was born. Same as traditional LCD display technology, quantum dot display is also a non-luminescent display device, which requires a backlight module to provide uniform light, so the performance of the backlight module directly determines the display quality of the quantum dot display. The difference between the two is that the traditional LCD uses white light as the light source, while the quantum dot liquid crystal display needs blue light to excit...

Claims

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Application Information

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IPC IPC(8): G02B5/02
CPCG02B5/0226G02B5/0242G02B5/0268
Inventor 李刚孙书政徐良霞李培源刘伟陈冲徐雍捷唐海江张彦
Owner NINGBO EXCITON TECH
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