Preparation method for low-stress compact coating layer

Abstract

The invention discloses a preparation method for a low-stress compact coating layer. The preparation method comprises the following steps: step 1, thoroughly cleaning a workpiece, placing the workpiece in a vacuum chamber and vacuumizing until the vacuum degree is more than 6*10<-4>Pa, charging inert gas argon, controlling a bias voltage to be -800V to -1000V, and etching the surface of the workpiece for 10 minutes to 60 minutes; step 2, charging the inert gas argon, sputtering an interlayer Ti or Cr with a thickness of 100nm to 500nm; and step 3, charging the mixed gas of inert gases argon and krypton, argon and xenon or argon, krypton and xenon, and sputtering the needed deposited coating layer. In a sputtering deposition process, a working gas is the mixed gas of argon and krypton, argon and xenon or argon, krypton and xenon, and the reasonable deposition bias voltage is controlled, so that the stress level of the coating layer is controlled. Relative to the traditional coating layer, the pressure stress is lower under the condition of obtaining a compact structure; and the preparation method is applicable to the application fields of coating layers with high binding performancerequirements and large thicknesses.

Description

technical field [0001] The invention belongs to the field of vacuum deposition coating preparation technology, in particular to a preparation method of low-stress dense coating, which can be used for the preparation of thick / ultra-thick coating. Background technique [0002] At present, the thickness of dense hard coatings prepared by magnetron sputtering generally does not exceed 10um. The main reason is that excessive compressive stress deteriorates the bonding performance of the thick coating / substrate, and also causes the coating itself to break and fail under load. . During the deposition process, ions bombard the coating, which induces interstitial defects in the coating, which is the main cause of compressive stress. The increase of coating thickness can greatly improve the bearing capacity of the substrate surface, and at the same time significantly improve the wear life. Therefore, thick hard coatings (thickness greater than 10um) have wider industrial application ...

AI Technical Summary

Problems solved by technology

However, for ultra-low negative bias voltage, insufficient ion bombardment will lead to loose coating, the annealing method may not be able to relieve the stress in time or the performance of the substrate may be deteriorated due to excessive annealing, and the mechanical properties of the coating are often poor through gradient or multi-layer design.