A kind of photolithography invisible grid infrared absorption film resin lens and preparation method thereof
A resin lens and infrared absorption technology, applied in microlithography exposure equipment, optomechanical equipment, optics, etc., can solve problems such as verification deterioration, visual impairment, etc., and achieve the effects of precise structure, comfortable vision, and reduced visual damage
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[0037] The preparation method of the lithographic invisible grid infrared absorption film resin lens of the present invention comprises the following steps:
[0038]The first step is to make a mask suitable for the lens. The mask is a curved mask or a gradient flat mask. The upper surface of the arc-shaped mask plate protrudes outward to form a convex arc surface, and the lower surface is a plane. The convex arc surface matches the concave surface of the resin lens. The first mask pattern that matches the mesh. The first mask pattern is composed of a number of outwardly protruding circular sheets. Each circular sheet is distributed in a honeycomb shape on the convex arc surface of the mask. The circular sheet The size is consistent with the size of the round hole on the concave surface of the lens; the upper and lower surfaces of the gradient flat mask are flat, and the middle of the upper surface has a second mask pattern that matches the mesh on the concave surface of the le...
Embodiment 1
[0050] 1) Make a mask that fits the concave surface of the lens, the mask is a gradient flat mask, and the size of the mask is 127×127nm. The upper and lower surfaces of the gradient flat mask are flat, and the center of the upper surface has a second mask pattern that matches the mesh on the concave surface of the lens. The second mask pattern is circular (diameter 90mm), and the second mask pattern is composed of many circular flakes protruding outward, each circular flake is distributed in a honeycomb shape on the upper surface of the mask, and the center distance between two adjacent circular flakes is 0.6 ~0.9mm, the second mask pattern includes a central area and a ring-shaped outer area. The central area is located at the center of the upper surface with a diameter of 20mm. The second mask pattern removes the rest of the central area (diameter 20mm to diameter 90mm within the range) is the outer area of the ring, the diameter of the circular flakes located in the cent...
Embodiment 2
[0061] 1) Make a mask that fits the concave surface of the lens. The mask is a curved mask, and the upper surface of the curved mask is convex outward to form a convex arc surface (the surface curvature is 2.00C). The lower surface is flat, and the convex arc coincides with the concave surface of the resin lens. The convex arc has a first mask pattern matching the mesh on the concave surface of the lens. The first mask pattern It consists of many circular flakes protruding outward, each circular flake is distributed in a honeycomb shape on the convex arc surface of the mask, and the size of the circular flakes is consistent with the size of the circular hole on the concave surface of the lens (see image 3 ). Then, prepare a thiourethane single-hardened lens with a refractive index of 1.600 and a UV protection value of 401 nm. The concave surface curvature of the lens is 2.00C, and the optical power is +3.00D.
[0062] 2) Spin-coat a layer of positive photoresist (model RZJ-3...
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Abstract
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