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An electrically visible-infrared response metasurface film and a preparation method thereof

ActiveCN117344276BEnhanced infrared absorptionHighly variable emissivity performanceFinal product manufactureVacuum evaporation coatingElectrochromismPhotolithography
The application is based on electrochromic material technology, and particularly relates to an electrochromic visible-infrared response super surface film and a preparation method thereof. The preparation method comprises the following steps: step-by-step magnetron sputtering, depositing a conductive layer, tantalum pentoxide and tungsten oxide film on a substrate in sequence to form a device bottom electrode, a dielectric layer and an electrochromic layer; based on a mask, the film is subjected to a gluing-photolithography process, the electrochromic layer is etched by an argon ion beam to realize super surface pattern preparation; and the film is subjected to an annealing process in an air atmosphere to crystallize the tungsten oxide layer. The application has good visible-infrared compatible response performance, and simultaneously realizes visible color change and high variable emissivity in an infrared wave band (2.5-15 mu m).
Owner:SHENZHEN RES INST OF SHANGHAI JIAOTONG UNIV +1