Cyclic utilization method of solar silicon wafer texturing solution
A solar silicon wafer and solution technology, applied in chemical instruments and methods, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of long time, complicated operation, affecting the etching effect, etc., to reduce emissions and achieve significant economic benefits , the effect of significant environmental benefits
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Embodiment 1
[0019] The recycling method of a solar silicon wafer texturing solution according to this embodiment includes the following steps:
[0020] (1) The solar silicon wafer is etched with a mixed solution of 43.5wt% nitric acid and 10.8wt% hydrofluoric acid, and the balance is water as the texturing solution, and the etched mixed solution is recycled with a reverse osmosis membrane The separation device separates fluosilicic acid impurities in the etching tank, and the reverse osmosis membrane is a selective nanofiltration membrane;
[0021] (2) Quantitatively analyze the hydrofluoric acid and nitric acid in the mixed solution after the separation of impurities by an automatic potentiometric titrator and an automatic nitrate ion selective electrode automatic measuring potentiometer to obtain the increase or decrease of the composition concentration of the mixed solution after etching ; First, accurately weigh 100ml of boiled and cooled pure water with a 100ml plastic bottle, accura...
Embodiment 2
[0024] The recycling method of a solar silicon wafer texturing solution according to this embodiment includes the following steps:
[0025] (1) The solar silicon wafer is etched with a mixed solution with a concentration of 40wt% nitric acid and 8wt% hydrofluoric acid, and the balance is water as the texturing solution, and the mixed solution after etching is recycled with a reverse osmosis membrane separation device The fluorosilicic acid impurities are separated in the etching tank, and the reverse osmosis membrane is a selective nanofiltration membrane;
[0026] (2) Quantitatively analyze the hydrofluoric acid and nitric acid in the mixed solution after the separation of impurities by an automatic potentiometric titrator and an automatic nitrate ion selective electrode automatic measuring potentiometer to obtain the increase or decrease of the composition concentration of the mixed solution after etching ; First, accurately weigh 100ml of boiled and cooled pure water with a...
Embodiment 3
[0029] The recycling method of a solar silicon wafer texturing solution according to this embodiment includes the following steps:
[0030] (1) The solar silicon wafer is etched with a mixed solution of 45wt% nitric acid and 12wt% hydrofluoric acid, and the balance is water as the texturing solution, and the etched mixed solution is recycled with a reverse osmosis membrane separation device The fluorosilicic acid impurities are separated in the etching tank, and the reverse osmosis membrane is a selective nanofiltration membrane;
[0031] (2) Quantitatively analyze the hydrofluoric acid and nitric acid in the mixed solution after the separation of impurities by an automatic potentiometric titrator and an automatic nitrate ion selective electrode automatic measuring potentiometer to obtain the increase or decrease of the composition concentration of the mixed solution after etching ; First, accurately weigh 100ml of boiled and cooled pure water with a 100ml plastic bottle, accu...
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