Antibiotic residue treatment process
An antibiotic bacteria residue and treatment process technology, applied in chemical instruments and methods, solid waste removal, transportation and packaging, etc., can solve problems such as endangering public health safety and bacterial drug resistance accumulation, and improve production efficiency and ensure safety. sexual effect
Inactive Publication Date: 2018-09-07
CGN DASHENG ELECTRON ACCELERATOR TECH
View PDF6 Cites 10 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0006] Antibiotic residues are mainly derived from the production process of antibiotics. Therefore, antibiotic residues contain residual antibiotics. If they enter the natural world without treatment, it is easy to cause the accumulation of bacterial resistance and form "super bacteria", which endangers public health and safety.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment
[0033] For antibiotic residues, we conducted experiments through the above parameters, and the experimental data obtained are as follows:
[0034] Wherein the treatment condition of sulfur red bacteria residue is irradiation+hydrogen peroxide oxidant, about 20kGy+6% hydrogen peroxide; Compared with the general treatment process, the pollutant content has been reduced by more than 50%, and the effect is obvious.
[0035]
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More
Abstract
The invention discloses an antibiotic residue treatment process. Electronic beams are used for performing the radiation treatment for the antibiotic residue, the electronic beams directly act on antibiotic molecules and / or antibiotic genes to destruct the structure, a majority of electronic beams act on the water molecules in the antibiotic residue to generate strong oxidant particles such as hydroxyl free radicals (.OH) and peroxide (H2O2), a same amount of strong reduction particles such as hydrate electrons (eaq-) and hydrogen atoms (H.) is generated, the free particles are used for destructing the structure of the antibiotics and the antibiotic resistant genes, and the sterilizing, disinfecting, deodorizing and floc decomposition purposes can be simultaneously realized.
Description
technical field [0001] The invention relates to a process for treating antibiotic scum, in particular to a process capable of realizing complete harmless treatment of antibiotic slag. Background technique [0002] my country is a big country in the production and use of antibiotics. As of 2015, the annual output of antibiotics in China reached 210,000 tons, and the export of antibiotics accounted for about 70% of the international market share. A large amount of antibiotic residues will be produced during the production of antibiotics. According to statistics, 10 tons of antibiotic residues will be produced for every 1 ton of antibiotics produced. Antibiotic residues contain residual antibiotics and antibiotic resistance genes. Without effective treatment, antibiotic residues are directly discharged into the environment, seriously damaging the ecological environment. In 2008, antibiotic residues (fermented pharmaceutical residues) were included in the "National List of Haza...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More
IPC IPC(8): B09B3/00
CPCB09B3/00B09B3/40
Inventor 陈川红张剑锋何仕均张幼学周佩芳
Owner CGN DASHENG ELECTRON ACCELERATOR TECH
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com