Benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane, preparation method thereof, and preparation method of resin containing benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane

A benzocyclobutene-functional, dimethylsiloxy technology, applied in chemical instruments and methods, organic chemistry, silicon organic compounds, etc., can solve problems such as poor film-forming performance, difficult processing, and low dielectric properties , to achieve the effect of low dielectric properties, easy operation, high thermal stability and

Active Publication Date: 2018-09-11
SOUTHWEAT UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, traditional organosiloxane materials have poor film-forming performance and are not easy to process
However, the organosiloxane resins in the existing reports still cannot meet the needs of the growing microelectronics industry. The thermal stability and low dielectric properties of the existing organosiloxane resins need to be further improved.

Method used

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  • Benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane, preparation method thereof, and preparation method of resin containing benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane
  • Benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane, preparation method thereof, and preparation method of resin containing benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane
  • Benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane, preparation method thereof, and preparation method of resin containing benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane

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preparation example Construction

[0027] Another aspect of the present invention provides a method for preparing benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane. In an exemplary embodiment of the preparation method of benzocyclobutene-functionalized tetrakis(dimethylsiloxy)silane of the present invention, the preparation method includes:

[0028] Step S01, preparing a solution containing a catalyst.

[0029] In this example, the catalyst may be a platinum catalyst, and preferably, the catalyst may be chloroplatinic acid. Of course, the catalyst of the present invention is not limited to this, as long as it can promote the reaction of the present invention.

[0030] In this example, in the solution containing the catalyst, in order to make the reaction more fully and without wasting raw materials, the concentration of the catalyst may be 0.020 mol / L to 0.030 mol / L. Preferably, it can be 0.022 mol / L to 0.028 mol / L, more preferably, it can be 0.025 mol / L. The solution of the catalyst may be a tetrahydr...

example 1

[0062] Method for preparing benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane. The preparation method may include the following steps:

[0063] In a dry anaerobic flask equipped with a magnetic stirrer, add tetrakis(dimethylsiloxy)silane (TMSS) (2.85g, 8.66mmol), 15mL dry toluene, monosubstituted tetramethyldivinyl Siloxybenzocyclobutene (10.24g, 35.51mmol), 0.025mol / L chloroplatinic acid in tetrahydrofuran solution 300μL. The reaction was continued for 48 hours at a reaction temperature of 75°C and strong stirring to obtain the first material after the reaction. The first material after the reaction was cooled to room temperature and filtered through silica gel (to remove the catalyst in the crude product) to obtain a colorless solution. After removing the toluene from the colorless solution at the temperature of a rotary evaporator (evaporate until no toluene is distilled out), a light yellow liquid is obtained. After the liquid was subjected to silica gel colum...

example 2

[0068] The preparation method of benzocyclobutene functionalized tetrakis (dimethylsiloxy) silane, the steps of the preparation method are:

[0069] In a dry anaerobic flask equipped with a magnetic stir bar, add tetrakis (dimethylsiloxy) silane (TMSS) (2.85g, 8.66mmol), 15mL dry toluene, monosubstituted tetramethyldivinyl Siloxy benzocyclobutene (10.49 g, 36.37 mmol), 0.025 mol / L chloroplatinic acid in tetrahydrofuran solution 300 μL, reacted continuously for 36 hours at a reaction temperature of 80° C. and strong stirring, to obtain the reacted material. After the reaction, the material was cooled to room temperature, filtered through silica gel (to remove the catalyst in the crude product) to obtain a colorless solution. After the colorless solution was used to remove toluene at the temperature of a rotary evaporator (evaporate until no toluene was distilled), a light yellow liquid was obtained . After the liquid was subjected to silica gel column chromatography (silica gel c...

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Abstract

The invention provides a benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane, a preparation method thereof, and a preparation method of resin containing the benzocyclobutene functionalizedtetrakis(dimethylsiloxy)silane. The preparation method of the benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane comprises the following steps: preparing a solution containing a catalyst;mixing tetrakis(dimethylsiloxy)silane with monosubstituted tetramethyldivinylsiloxybenzocyclobutene, adding the solution containing the catalyst under the protection of an inert atmosphere, and performing stirring at a temperature of 75-85 DEG C until the reaction ends in order to obtain a first material; and separating and purifying the first material to obtain the benzocyclobutene functionalizedtetrakis(dimethylsiloxy)silane. The preparation methods have the advantages of simple process, easiness in separation and purification, high yield, easiness in operation and strong practicability, and the prepared benzocyclobutene functionalized tetrakis(dimethylsiloxy)silane resin has excellent properties, and is suitable for the fields of the microelectronics industry, aerospace and national defense.

Description

Technical field [0001] The invention relates to the field of polymer compounds, in particular to a benzocyclobutene functionalized tetrakis (dimethylsiloxy) silane and a preparation method thereof and a preparation method of a resin containing the same. Background technique [0002] With the rapid development of the aerospace and microelectronics industries, the size of VLSIs continues to shrink, signal processing speeds continue to increase, and the wiring density continues to increase, resulting in signal transmission delays, crosstalk, and power consumption, which have seriously hindered high speed, The development of high-density, low-power, and multi-function VLSI circuits. Therefore, VLSI requires interlayer dielectric materials to meet the comprehensive excellent performance of low dielectric, low loss, high thermal stability and high mechanical properties. [0003] Organosiloxanes have been widely used in electronic appliances, aerospace, petrochemical, and national defens...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07F7/08C08G77/04C08G77/06C08G77/20
CPCC07F7/0827C08G77/04C08G77/06C08G77/20C08G77/80
Inventor 杨军校韦雪莲尹强胡欢李娴范立马佳俊
Owner SOUTHWEAT UNIV OF SCI & TECH
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