Preparation method of high-efficiency polycrystalline silicon ingot and high-efficiency polycrystalline silicon ingot

A polycrystalline silicon ingot, high-efficiency technology, applied in the direction of polycrystalline material growth, chemical instruments and methods, single crystal growth, etc., can solve the problems of high process difficulty and difficulty in controlling the melting state of broken silicon materials, so as to reduce process difficulty and save cost The effect of improving the material time, improving the yield rate and high efficiency ratio

Active Publication Date: 2020-09-08
YINGLI ENERGY CHINA
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  • Abstract
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  • Claims
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Problems solved by technology

[0003] In view of this, the embodiment of the present invention provides a method for preparing a high-efficiency polycrystalline silicon ingot and a high-efficiency polycrystalline silicon ingot to solve the problems in the prior art that it is difficult to control the melting state of the crushed silicon material and the process is difficult when preparing a high-efficiency polycrystalline silicon ingot

Method used

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  • Preparation method of high-efficiency polycrystalline silicon ingot and high-efficiency polycrystalline silicon ingot

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Embodiment 1

[0030] Please refer to figure 1 , the preparation method of high-efficiency polysilicon ingot includes:

[0031] In step S101, a protective layer is coated on the inner surface of the crucible, and the material of the protective layer includes silicon nitride and pure water.

[0032] In the embodiment of the present invention, the crucible is a quartz crucible, and the main material is silicon dioxide. The protective layer needs to meet the following requirements: the protective layer has sufficient compactness and has a good isolation effect on the silicon liquid and the crucible; the chemical property is stable and does not react with the crucible and the silicon liquid; it has sufficient adhesion strength on the inner surface of the crucible, Does not fall off or burst at high temperatures. In this embodiment, the material of the protective layer is a mixed solution of high-purity silicon nitride and pure water. Silicon nitride can avoid direct contact between polysilico...

Embodiment 2

[0060] A high-efficiency polycrystalline silicon ingot is prepared according to the preparation method of the high-efficiency polycrystalline silicon ingot as described in the first embodiment of the present invention, and has the beneficial effects of the first embodiment of the present invention.

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Abstract

The invention is suitable for the technical field of photovoltaic cells, and provides a preparation method of efficient polycrystalline silicon ingot and efficient polycrystalline silicon ingot. The method includes the following steps of: coating a protective layer on the inner surface of a crucible, wherein the materials of the protective layer includes silicon nitride and pure water; coating a seeding layer on the upper surface of the protective layer coated on the bottom surface of the crucible, wherein the materials of the seeding layer comprises silicon nitride, pure water and silicon powder; placing polycrystalline silicon raw material in the crucible coated with the seeding layer, and placing the crucible in an ingot furnace, and vacuumizing the ingot furnace; heating the ingot furnace to a first preset temperature to completely melt the polycrystalline silicon raw material and the silicon powder to form silicon liquid; forming a super-cooling state at the bottom of the crucibleso that the silicon liquid forms crystal a nucleus at the bottom of the crucible; and the silicon liquid except for forming the crystal nucleus crystallize on the basis of the crystal nucleus to growinto efficient polycrystalline silicon ingot. According to the invention, the process difficulty can be reduced, and the material melting time can be saved.

Description

technical field [0001] The invention belongs to the technical field of photovoltaic cells, and in particular relates to a method for preparing a high-efficiency polycrystalline silicon ingot and the high-efficiency polycrystalline silicon ingot. Background technique [0002] High-efficiency polycrystalline silicon ingot has the advantages of low dislocation density, regular grain boundary structure and uniform grain distribution, and is a common material for making photovoltaic cells. At present, the common method of preparing high-efficiency polysilicon ingots is to lay crushed silicon material on the bottom of the crucible, and then put the polysilicon raw material into the crucible. The silicon material is used as the seed crystal, from which the nucleation begins to grow, and finally a high-quality silicon ingot is obtained. However, in this method, since it is necessary to ensure that when the polysilicon raw material is completely melted, the crushed silicon material ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B29/06C30B28/06
CPCC30B28/06C30B29/06
Inventor 刘志强王坤潘家明潘明翠王丙宽
Owner YINGLI ENERGY CHINA
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