Preparation method of high performance oxide coated nano-SnO2 negative electrode material
A negative electrode material, oxide technology, applied in nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problem of low expansion mechanical properties of tin-based materials, affecting the insertion and extraction of lithium ions, and affecting the tin-based materials. Material specific capacity and other issues, to achieve the effect of simple preparation method, inhibition of expansion, and good charge-discharge cycle performance
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Embodiment 1
[0034] A high-performance oxide-coated nano-SnO 2 The preparation method of negative electrode material, comprises the following steps:
[0035] S1 spherical nano SnO 2 Put the particles in a vacuum oven and bake at 80°C for 12 hours, take them out and put them in a brown reagent bottle to seal for later use;
[0036] S2, using the atomic layer deposition method, the dry spherical nano-SnO 2 The particles are put into the atomic layer deposition chamber, the chamber temperature is heated to 120°C, and ethylene glycol is used as the pulse precursor for passivation. The passivation time is 65s, and then purged with carrier gas;
[0037] S3. Using the atomic layer deposition method, the spherical nano-SnO loaded with passivation 2 The atomic layer deposition chamber of the particles was heated to 250 °C, using titanium pentaethoxide as the precursor A, and deionized water as the precursor B, the passivated spherical nano-SnO 2 The particles are subjected to cyclic deposition ...
Embodiment 2
[0040] A high-performance oxide-coated nano-SnO 2 The preparation method of negative electrode material, comprises the steps:
[0041] S1. Spherical nano SnO 2 Put the particles into a vacuum oven and bake at 100°C for 10 hours, take them out and put them into a brown reagent bottle to seal for later use;
[0042] S2, using the atomic layer deposition method, the dry spherical nano-SnO 2 The particles are put into the atomic layer deposition chamber, the temperature of the chamber is heated to 150°C, and ethylene glycol is used as the pulse precursor for passivation. The passivation time is 35s, and then purged with carrier gas;
[0043] S3. Using the atomic layer deposition method, the spherical nano-SnO loaded with passivation 2The atomic layer deposition chamber of the particles was heated to 350 °C, using titanium pentaethoxide as the precursor A and deionized water as the precursor B, the passivated spherical nano-SnO 2 The particles are subjected to cyclic deposition...
Embodiment 3
[0045] A high-performance oxide-coated nano-SnO 2 The preparation method of negative electrode material, comprises the steps:
[0046] S1. Spherical nano SnO 2 Put the particles into a vacuum oven and dry at 90°C for 11 hours, take them out and put them into a brown reagent bottle to seal for later use;
[0047] S2, dry spherical nano-SnO 2 The particles are put into the atomic layer deposition chamber, the temperature of the chamber is heated to 140°C, and ethylene glycol is used as the pulse precursor for passivation. The passivation time is 40s, and then purged with carrier gas;
[0048] S3. Using the atomic layer deposition method, the spherical nano-SnO loaded with passivation 2 The atomic layer deposition chamber of the particles was heated to 270 °C, using titanium pentaethoxide as the precursor A and deionized water as the precursor B, the passivated spherical nano-SnO 2 The particles are subjected to cyclic deposition and plating, and the cycle is stopped for 55 t...
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