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Pretreatment method for matrix surface of CVD diamond coating

A surface pretreatment, diamond coating technology, applied in metal material coating process, coating, gaseous chemical plating and other directions, can solve problems such as bad diamond film underlying structure, reduce film base bonding force, etc. Avoid negative effects, design scientific effects

Active Publication Date: 2018-11-16
四川纳涂科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is: provide a kind of CVD diamond coating substrate surface pretreatment method, solve the deep layer of the substrate during the coating operation in the prior art The migration of cobalt atoms to the surface of the substrate damages the underlying structure of the diamond film and reduces the bonding force of the film substrate

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  • Pretreatment method for matrix surface of CVD diamond coating

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Embodiment 1

[0026] The present embodiment provides the CVD diamond coating substrate surface pretreatment method of the present invention, specifically:

[0027] Step 1. Clean the tungsten carbide wire drawing die with an aperture of 2.0 mm for 5 minutes, and then dry it. After testing the cleanliness of the tungsten carbide wire drawing die, place it neatly in a graphite crucible, and place the crucible Put it into a vacuum carbonization furnace, pump to the ultimate vacuum and keep it for 8 minutes;

[0028] Step 2. Introduce hydrogen gas into the reaction chamber, the flow rate of hydrogen gas is 3500 sccm, heat to 1100 ° C, control the reaction pressure to 4000 Pa, react for 3 hours, after the reaction is completed, turn off the hydrogen gas, evacuate to the ultimate vacuum, and keep it for 8 minutes;

[0029] Step 3. Reduce the temperature of the reaction chamber to 850°C, feed oxygen into the reaction chamber, the flow rate of oxygen is 25sccm, control the reaction pressure to 1300P...

Embodiment 2

[0032] The present embodiment provides the CVD diamond coating substrate surface pretreatment method of the present invention, specifically:

[0033] Step 1. Clean the tungsten carbide wire drawing die with an aperture of 2.0 mm for 15 minutes, and then dry it. After testing the cleanliness of the tungsten carbide wire drawing die, place it neatly in a graphite crucible, and place the crucible Put it into a vacuum carbonization furnace, pump it to the limit vacuum and keep it for 3 minutes;

[0034] Step 2. Introduce hydrogen gas into the reaction chamber, the flow rate of hydrogen gas is 2500 sccm, heat to 1200 ° C, control the reaction pressure to 5000 Pa, and react for 1 hour. After the reaction is completed, turn off the hydrogen gas, evacuate to the ultimate vacuum, and keep it for 3 minutes;

[0035] Step 3. Reduce the temperature of the reaction chamber to 950°C, feed oxygen into the reaction chamber, the flow rate of oxygen is 15 sccm, control the reaction pressure to ...

Embodiment 3

[0038] The present embodiment provides the CVD diamond coating substrate surface pretreatment method of the present invention, specifically:

[0039] Step 1. Clean the tungsten carbide wire drawing die with an aperture of 2.0 mm for 10 minutes, and then dry it. After testing the cleanliness of the tungsten carbide wire drawing die, place it neatly in a graphite crucible, and place the crucible Put it into a vacuum carbonization furnace, pump it to the limit vacuum and keep it for 5 minutes;

[0040] Step 2. Introduce hydrogen into the reaction chamber, the flow rate of hydrogen is 3000sccm, heat to 1150°C, control the reaction pressure to 4500Pa, react for 2 hours, after the reaction, turn off the hydrogen, evacuate to the ultimate vacuum, and keep it for 5min;

[0041] Step 3. Reduce the temperature of the reaction chamber to 920°C, feed oxygen into the reaction chamber, the flow rate of oxygen is 20sccm, control the reaction pressure to 1200Pa, and react for 30 minutes. Afte...

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Abstract

The invention discloses a pretreatment method for the matrix surface of a CVD diamond coating, and solves the problems of the prior art that the bottom layer structure of a diamond film is damaged since the deep-layer cobalt atoms migrate to the matrix surface layer during the coating operation and consequently the film substrate adhesion is reduced. The pretreatment method comprises the followingsteps: performing ultrasonic cleaning of hard alloy wire-drawing dies and drying the hard alloy wire-drawing dies; putting the hard alloy wire-drawing dies in order into a graphite crucible; puttingthe crucible into a vacuum carbonization furnace, and pumping air till ultimate vacuum; introducing hydrogen, heating to a set temperature and controlling the reaction pressure for reaction; after thereaction, shutting off hydrogen and vacuumizing till ultimate vacuum; lowering the temperature of the reaction chamber, introducing oxygen into the reaction chamber and controlling the reaction pressure; after the reaction, turning off the power supply and the air supply, and vacuumizing the reaction chamber till ultimate vacuum; then closing a valve of the reaction chamber; after the dies are naturally cooled to normal temperature, taking out the dies for detection; performing ultrasonic crystal implantation on the qualified wire-drawing dies, and cleaning and drying the qualified wire-drawing dies. The method disclosed by the invention has the advantages of scientific design and simple process.

Description

technical field [0001] The invention belongs to the technical field of diamond coating, and in particular relates to a method for pretreatment of the surface of a CVD diamond coating substrate. Background technique [0002] CVD diamond coating has excellent properties such as ultra-high hardness, high elastic modulus, extremely high thermal conductivity, good self-lubrication and chemical stability. After continuous research and development, the growth mechanism of CVD diamond coating has been fully demonstrated. The growth of CVD diamond coating has very strict requirements on the surface environment, especially the cobalt content of the surface layer. Cobalt has a negative effect of catalyzing graphitization. Under the action of high temperature, cobalt catalyzes diamond to form graphite. In graphite atmosphere, diamond is difficult to grow in a large area, and the growth of diamond film is hindered. Holes will be generated on the surface or bottom layer of the coating fi...

Claims

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Application Information

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IPC IPC(8): C23C16/02C23C16/27
CPCC23C16/0272C23C16/27
Inventor 黄飞
Owner 四川纳涂科技有限公司
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