Microwave plasma vacuum film coating device and using method

A microwave plasma and vacuum coating technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of poor coating uniformity and consistency, chemical substances easily polluting the environment, and low sedimentation rate. , to achieve the effect of improving uniformity and consistency, improving coating production efficiency, and increasing sedimentation rate

Inactive Publication Date: 2018-12-18
朱广智
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing coating equipment and methods have the disadvantages of low sedimentation rate, low production efficiency, poor uniformity and consistency of the coating, poor waterproof, sweat-proof, moisture-proof, corrosion-re

Method used

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  • Microwave plasma vacuum film coating device and using method

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Embodiment 1

[0031] A microwave plasma vacuum coating equipment, used for coating the motherboard of mobile phone, including plasma generation system 1, vacuum exhaust device 2, plasma vacuum chamber 3 and movement device 4, plasma generation system 1, vacuum exhaust device 2 are set Outside the plasma vacuum chamber 3 , the moving device 4 is arranged inside the plasma vacuum chamber 3 .

[0032] The plasma generation system 1 includes an air inlet 11, an air outlet 12, a plasma field generator 13 for microwave discharge, the air inlet 11 is connected to the outside gas through an air inlet pipe 14, the air outlet 12 and the plasma vacuum chamber 3 connected.

[0033] The air inlet 11 of the plasma generation system 1 has two air inlet pipes 14 .

[0034] The microwave plasma vacuum coating equipment is provided with a plasma generation system 1, and each plasma generation system 1 is connected to a vacuum plasma chamber 3 through a pipeline.

[0035] The vacuum exhaust device 2 include...

Embodiment 2

[0047] A microwave plasma vacuum coating equipment, used for coating the automobile control board, including plasma generation system 1, vacuum exhaust device 2, plasma vacuum chamber 3 and motion device 4, plasma generation system 1, vacuum exhaust device 2 It is arranged outside the plasma vacuum chamber 3 , and the moving device 4 is arranged inside the plasma vacuum chamber 3 .

[0048] The plasma generation system 1 includes an air inlet 11, an air outlet 12, a plasma field generator 13 for microwave discharge, the air inlet 11 is connected to the outside gas through an air inlet pipe 14, the air outlet 12 and the plasma vacuum chamber 3 connected.

[0049] The air inlet 11 of the plasma generation system 1 has five air inlet pipes 14 .

[0050] The microwave plasma vacuum coating equipment is provided with six plasma generation systems 1, and each plasma generation system 1 is connected to a vacuum plasma chamber 3 through a pipeline.

[0051]The vacuum exhaust device ...

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Abstract

The invention discloses a microwave plasma vacuum film coating device and a using method. The device comprises a plasma generating system, a vacuum exhausting device, a plasma vacuum cavity and a movement device; the plasma generating system and the vacuum exhausting device are arranged outside the plasma vacuum cavity; and the movement device is arranged in the plasma vacuum cavity. The using method of the device comprises the following steps that the plasma vacuum cavity performs vacuumizing to perform pretreatment, film coating and the like on products to be subjected to film coating. According to the microwave plasma vacuum film coating device and the using method, a plasma chemical vapor deposition method is adopted for increasing the sedimentation rate of film coating substances andthe film coating production efficiency, and the film coating uniformity and consistency are improved; and meanwhile, the protective effects of waterproofness, sweat preventing, moisture preventing, corrosion resisting, solvent resisting and the like of a coating are improved at the same time, and application in occasions of various PCB, PCBA, electronic products, electric appliance parts, electronic half-finished products, metal, electronic parts and components, semiconductors, integrated circuit boards, plastic products and the like can be achieved.

Description

technical field [0001] The invention relates to the technical field of plasma chemical vapor deposition, in particular to a microwave plasma vacuum coating device and a use method. Background technique [0002] Plasma Enhanced Chemical Vapor Deposition PECVD: It uses microwave or radio frequency to ionize the gas containing the constituent atoms of the film to form plasma locally, and the plasma is very chemically active and easy to react, depositing the desired film on the substrate . In order to enable the chemical reaction to proceed at a lower temperature, the activity of the plasma is used to promote the reaction, so this CVD is called plasma-enhanced chemical vapor deposition (PECVD). Experimental mechanism: The gas containing the constituent atoms of the film is locally formed into plasma by means of microwave or radio frequency, and the plasma is chemically active and easily reacts to deposit the desired film on the substrate. [0003] The existing coating equipmen...

Claims

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Application Information

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IPC IPC(8): C23C16/458C23C16/511C23C16/52
CPCC23C16/4584C23C16/511C23C16/52
Inventor 朱广智
Owner 朱广智
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