A way to improve bifeo 3 Annealing Method for Thin Film Magnetoelectric Coupling Effect
A technology of magnetoelectric coupling effect and thin film, which is applied in the direction of metal material coating process, coating, liquid chemical plating, etc., can solve the problem that the performance cannot meet the needs of microelectronic devices, and achieve the improvement of ferroelectricity and magnetoelectric coupling effect of effect
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Embodiment 1
[0015] According to the above process, the prepared dry mold was placed in a rapid annealing furnace. The pretreatment temperature of the odd-numbered film samples was 300 °C, and the pre-treatment temperature of the even-numbered film samples was 400 °C, and the holding time was 150 s. The pyrolyzed film was annealed. The annealing temperature of the odd-numbered film sample was 400°C, the annealing temperature of the even-numbered film sample was 650°C, and the holding time was 400s to obtain a crystalline film sample. The two stages of wet film preparation and heat treatment film formation were repeated to obtain a film sample of required thickness, and the final number of layers of the prepared film was 16 layers.
Embodiment 2
[0017] According to the above process, the prepared dry mold was placed in a rapid annealing furnace. The pretreatment temperature of the odd-numbered film samples was 300 °C, and the pre-treatment temperature of the even-numbered film samples was 400 °C, and the holding time was 150 s. The pyrolyzed film was annealed. The annealing temperature of the odd-numbered film sample was 450°C, the annealing temperature of the even-numbered film sample was 700°C, and the holding time was 400s to obtain a crystalline film sample. The two stages of wet film preparation and heat treatment film formation were repeated to obtain a film sample of required thickness, and the final number of layers of the prepared film was 16 layers.
Embodiment 3
[0019] According to the above process, the prepared dry mold was placed in a rapid annealing furnace. The pretreatment temperature of the odd-numbered film samples was 300 °C, and the pre-treatment temperature of the even-numbered film samples was 400 °C, and the holding time was 150 s. The pyrolyzed film was annealed. The annealing temperature of the odd-numbered film sample was 500°C, the annealing temperature of the even-numbered film sample was 750°C, and the holding time was 400s to obtain a crystalline film sample. The two stages of wet film preparation and heat treatment film formation were repeated to obtain a film sample of required thickness, and the final number of layers of the prepared film was 16 layers.
[0020] Ferroelectricity (2Pr) Magnetic (2Mc) Example 1 98μC / cm 2
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