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Apparatus and method for measuring phase transition temperature of thin film materials

A technology of phase change temperature and thin film materials, which is applied in the directions of measuring devices, analytical materials, phase influence characteristics measurement, etc., can solve the problems of limited measurement accuracy, large measurement error of high temperature thin films, and inability to perform continuous transient measurement.

Active Publication Date: 2021-05-11
WUHAN SCHWAB INSTR TECH
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Problems solved by technology

[0003] At present, the commonly used methods for measuring the phase transition temperature of materials are mainly differential thermal analysis (DSC) and variable temperature X-ray diffraction. The former needs to scrape the film sample into powder, which is a destructive measurement, and has certain requirements for the thickness of the film. Thin films cannot be measured; the latter has limited measurement accuracy, and the measurement error of high-temperature thin films is relatively large, and continuous and transient measurements cannot be performed

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  • Apparatus and method for measuring phase transition temperature of thin film materials
  • Apparatus and method for measuring phase transition temperature of thin film materials

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Embodiment Construction

[0027] In order to have a clearer understanding of the technical features, purposes and effects of the present invention, the specific implementation manners of the present invention will now be described in detail with reference to the accompanying drawings.

[0028] Such as Figure 1-2 Shown is a device for measuring the phase transition temperature of a thin film material in a preferred embodiment of the present invention, including a substrate 10, an electrode 20, an infrared temperature detector 30, a laser light source 40, a Doppler detector 50, a femtosecond Pulsed laser light source 60. The substrate 10 is used to lay the film to be tested 200 , the electrodes 20 are placed on the film to be tested 200 to heat the film to be tested 200 , and the infrared temperature detector 30 is used to monitor the temperature of the film to be tested 200 . The laser light source 40 and the Doppler detector 50 are symmetrically installed on the top of the film 200 to be tested, the ...

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Abstract

The invention relates to a device for measuring the phase transition temperature of a thin film material, comprising a substrate, an electrode, an infrared temperature detector, a laser light source, a Doppler detector, and a femtosecond pulsed laser light source; the substrate is used for laying a thin film to be measured , the electrode is placed on the film to be tested, and the infrared temperature detector monitors the temperature of the film to be tested; the laser light source obliquely shoots the probe light to the surface of the film to be tested, and the femtosecond pulse laser light source shoots the femtosecond laser pulse vertically to the same incident point, so that the Acoustic waves are generated in the film, so that the reflected light of the probe light on the surface of the film to be tested causes a Doppler frequency shift, and the Doppler detector is used to detect the Doppler frequency shift signal of the reflected light. The measurement device and method of the present invention utilizes femtosecond laser to induce the thin film to generate sound waves, utilizes the difference in refractive index between the crystalline state and the amorphous state of the thin film, and responds to the time difference when the sound wave travels back and forth in a thin film with a certain thickness, and passes through the Doppler detector Detects the Doppler shifted signal of reflected light, which has the advantage of fast and non-destructive measurement.

Description

technical field [0001] The invention relates to the technical field of thin film thermal performance detection, in particular to a measuring device and method for detecting the phase transition temperature of thin film phase change materials. Background technique [0002] In recent years, non-volatile memory (NVM) technology has made some significant progress in many aspects, which has brought new opportunities for the improvement of storage energy efficiency in computer systems. Researchers have suggested that new NVM technology should be used to replace traditional storage technology to meet the demand for high storage energy efficiency in the development of computer technology. A variety of new NVM technologies represented by phase-change memory have attracted extensive attention from researchers at home and abroad because of their high integration and low power consumption. Phase-change memory stores data by using the difference in conductivity of phase-change materials...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/41
CPCG01N21/41G01N2021/4126
Inventor 缪向水陈子琪童浩王愿兵蔡颖锐
Owner WUHAN SCHWAB INSTR TECH