SPR neural synaptic device based on a-SiOxNy memristor effect and preparation method thereof
A technology of neural synapse and memristor, which is applied in the field of bionic devices, can solve the problems of small signal processing bandwidth and easy crosstalk in signal transmission, and achieve the effects of large signal processing bandwidth, strong anti-electromagnetic interference ability, and reduced optical loss
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Embodiment 1
[0035] A based on a-SiO x N y SPR neurosynaptic device with memristive effect, its structure is as follows figure 1 Shown: include a memristor and a crystalline silicon prism 6 arranged above the memristor. In this embodiment, the crystalline silicon prism 6 is a triangular prism processed from crystalline silicon. The memristor has "Bottom electrode 1 / first a-SiO x N y Resistive switch layer 2 / second a-SiO x N y Resistive variable layer 3 / top electrode 4" vertical four-layer structure. In this embodiment, the top electrode 4 is metal silver Ag deposited on the bottom surface of the crystalline silicon prism 6, and the second a-SiO x N y The resistive layer 3 is a-SiO containing Ag nanoparticles x N y thin film with a volume fraction of Ag nanoparticles of 40%, the first a-SiO x N y The resistive switch layer 2 is a-SiO containing Ag nanoparticles x N y film, whose volume fraction of Ag nanoparticles is 5%, and the top electrode 4 is deposited on the first a-SiO x...
Embodiment 2
[0044] A based on a-SiO x N y SPR neurosynaptic device with memristive effect, its structure is as follows figure 1 Shown: comprise memristor and be arranged on the crystalline silicon wafer 5 above described memristor and be arranged on the crystalline silicon prism 6 above described crystalline silicon wafer 5, in the present embodiment, crystalline silicon prism 6 is processed by crystalline silicon The formed triangular prism, the crystalline silicon wafer 5 is also processed from crystalline silicon, and the crystalline silicon wafer 5 and the crystalline silicon prism 6 are preferably bonded with a refractive index matching liquid, and the memristor has a bottom-to-top Electrode 1 / first a-SiO x N y Resistive switch layer 2 / second a-SiO x N y Resistive variable layer 3 / top electrode 4" vertical four-layer structure, top electrode 4 top electrode 4 in this embodiment is metal silver Ag deposited on the bottom surface of crystalline silicon prism 6, the second a-SiO x...
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