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Method and apparatus for generating irradiated radiation

A radiation beam and radiation source technology, applied in X-ray equipment, irradiation devices, optomechanical equipment, etc., can solve the problems of accuracy and practicability

Active Publication Date: 2020-12-25
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] Additionally, radiation sources emitting at DUV or EUV wavelengths may not be optimized to perform metrology measurements, which may negatively impact the accuracy and usefulness of such measurements

Method used

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  • Method and apparatus for generating irradiated radiation
  • Method and apparatus for generating irradiated radiation
  • Method and apparatus for generating irradiated radiation

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Embodiment Construction

[0058] Before describing embodiments of the invention in detail, it is helpful to provide an example environment in which embodiments of the invention may be implemented.

[0059] figure 1 Lithographic apparatus LA is shown at 200 as part of an industrial facility implementing high volume lithographic fabrication processes. In this example, the fabrication process is adapted for fabricating semiconductor products (integrated circuits) on substrates such as semiconductor wafers. Those skilled in the art will recognize that a wide variety of products can be made by processing different types of substrates in variations of this process. The production of semiconductor products is purely an example that is of great commercial interest today.

[0060] Within the lithographic apparatus (or simply "lithographic tool" 200 ), a measurement station MEA is shown at 202 and an exposure station EXP is shown at 204 . The control unit LACU is shown at 206 . In this example, each substra...

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Abstract

A method for generating illumination radiation in an illumination device used in an inspection device for a lithographic process is described. A drive radiation beam (702) comprising a plurality of radiation pulses (704) is provided. The beam is split into a first plurality of driving radiation pulses and a second plurality of driving radiation pulses (706a, 708a). The plurality of drive radiation pulses each have controllable characteristics. The first plurality of driving radiation pulses and the second plurality of driving radiation pulses may be used to generate an illumination radiation beam having an output wavelength spectrum. The first controllable characteristic and the second controllable characteristic are controlled to respectively control the first part and the second part of the output wavelength spectrum of the illuminating radiation beam.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS [0002] This application claims priority to EP application 16168237.2 filed on May 4, 2016, the entire contents of which are incorporated herein by reference. technical field [0003] The present invention relates to methods and apparatus for generating illuminating radiation. In particular, the present invention relates to a method and apparatus for generating illuminating radiation in a harmonic generating radiation source. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. Lithographic apparatuses may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate circuit patterns to be formed on individual layers of the IC. This pattern can be transferred onto a target portion (eg, including one or seve...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02F1/35H05G2/00
CPCG03F7/70625H05G2/00G02F2201/16G02F1/354G03F7/70575G03F7/2004G02F1/353G21K5/04G03F7/70033G03F7/70633G03F7/70G03F7/706847
Inventor 林楠S·B·鲁博尔S·G·J·马斯杰森
Owner ASML NETHERLANDS BV
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