Industrial separation method of N-methylformamide and diethylene glycol monomethyl ether

A separation method and industrial technology, applied in carboxylic acid amide separation/purification, ether separation/purification, ether preparation, etc., can solve the problem of high energy consumption of NMF and MDG mixture, achieve green energy consumption, low energy consumption, and simple process Effect

Inactive Publication Date: 2018-12-28
福建钰融科技有限公司 +2
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention overcomes the disadvantage of high energy consumption in the separation of NMF and MDG mixtures by conventional rectification methods, fully utilizes the advantages of molecu

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Industrial separation method of N-methylformamide and diethylene glycol monomethyl ether

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0012] The mixture of NMF and MDG is fed at a flow rate of 360 kg / h at room temperature, and the pressure of the decompression degassing tower is 5000-10000 Pa. According to Henry's law, in a sealed container at a certain temperature, the partial pressure of the gas is the same as the gas dissolved in the solution. Proportional to the molar concentration within. After treatment in the decompression degassing tower, more than 90% of the gas content in the material is removed. It reduces the mist splash caused by the sudden pressure drop after the material enters the molecular distillation tower. After the material enters the molecular distillation tower, the molecules fly out of the liquid surface continuously and rapidly through heating and depressurization and the continuous renewal of the liquid film. MDG with a long average free path of molecules can fly to the condensation surface for enrichment, while the average free path of molecules is short NMF can only be enriched a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to an industrial separation method of main components N-methylformamide (NMF) and diethylene glycol monomethyl ether (MDG) in an electronic chemical stripper. A low-pressure molecular distillation method is adopted to efficiently recover the NMF and the MDG in the waste electronic chemical stripper, and has the advantages of energy saving and safety and environmental protection. A high-purity NMF and MDG separation refining process mainly comprises the following steps of 1) depressurization and degassing: decompressing and degassing the mixture of the NMF and the MDG to prevent entrainment splashing caused by sudden pressure drop after materials enter a molecular rectification tower; 2) molecular rectification of enabling the degassed materials to enter the molecularrectification tower achieve separation by utilizing the feature that molecular mean free paths of the two components are different. Compared with the conventional process, the method achieves the effect that the the purity of the finished NMF and the finished MDG is over 99%, and the rectified NMF and the rectified MDG reach the purity requirement of the electronic chemical stripper and achieve the separation and the purification of the NMF and the MDG.

Description

technical field [0001] The invention relates to a process for refining and purifying waste stripping liquid of electronic chemicals. The main components are N-methylformamide (NMF) and diethylene glycol monomethyl ether (MDG). Background technique [0002] The stripper is used to remove the photoresist on the microcircuit mask in the manufacture of liquid crystal display panels, semiconductor integrated circuits, etc. The stripper is mainly a mixture of organic amines and polar organic solvents. The present invention is mainly aimed at the stripping liquid with NMF and MDG as the main components. After use, the stripping liquid becomes a waste stripping liquid due to the introduction of other impurities. The waste stripping liquid is separated and purified to obtain a mixture based on NMF and MDG. After further separation and purification, high-purity NMF and MDG are obtained, and the high-purity NMF and MDG can be regenerated after being formulated into a stripping solution...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C07C233/03C07C231/24C07C43/13C07C41/42
CPCC07C231/24C07C41/42C07C233/03C07C43/13
Inventor 林秋玉陈广鹏陈盛保
Owner 福建钰融科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap