Manufacturing method of double-sided multi-step cavity LTCC substrate
A manufacturing method and multi-step technology, applied in semiconductor/solid-state device manufacturing, electrical solid-state devices, semiconductor devices, etc., can solve problems such as short interconnection paths, parasitic interference of radio frequency signals, and affecting circuit performance, so as to improve electrical performance, Effects of improving performance and ensuring lamination accuracy
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0037] The present invention is described in further detail below in conjunction with accompanying drawing:
[0038] The specific manufacturing method is as follows:
[0039] The first step: if figure 1 As shown, the green ceramic sheet 1 is pre-dried, punched and opened, filled and printed with conductors, and dried with metal conductors according to the traditional process.
[0040] Part 2: Release treatment of green ceramic sheet 1;
[0041] Such as figure 2 As shown, the green ceramic sheet 1 is adsorbed on the suction cup 6 by process vacuum during demoulding, and then the PET film 4 of the green ceramic sheet 1 is removed, and then the adsorption is cancelled, and the green ceramic sheet 1 is removed.
[0042] When the suction cup 6 absorbs the green ceramic sheet 1, the position of the cavity 3 of the green ceramic sheet 1 should be staggered to prevent the suction force from decreasing.
[0043] The third step: 1 stack of green ceramic sheets is used as the substr...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com