Silicon low surface energy self-cleaning nano-coating for photovoltaic panel
A nano-coating, low surface technology, applied in the field of materials, can solve the problems of increased surface energy of modified resin, low bonding strength, short service time, etc., and achieve low surface energy reduction, compact surface structure, and reduced roughness. Effect
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Embodiment 1
[0030] Embodiment one: 20 parts of nano photocatalyst, 50 parts of first solvent, 0.5 part of polyvinylidene fluoride, 50 parts of second solvent, 100 parts of low surface energy resin, 20 parts of carbon powder; Nano photocatalyst and first The solvents were mixed, and then stirred at a temperature of 35° C. and a rotation speed of 1200 r / min for 45 minutes to obtain a first mixture, and polyvinylidene fluoride, a second solvent and a diluent were added to the first mixture, and at a temperature of 45 ℃, stirring at 900r / min for 45min to obtain the second mixture. Add a low surface energy resin to the second mixture and stir for 45min at a temperature of 85℃ to obtain the third mixture. In the third mixture Add charcoal powder, stir at 100°C for 60 minutes, then lower the temperature to 65°C, evaporate for 2 hours, then apply a thin layer and bake at 30°C.
Embodiment 2
[0031] Embodiment two: 30 parts of nano photocatalyst, 80 parts of first solvent, 1.0 parts of polyvinylidene fluoride, 80 parts of second solvent, 120 parts of low surface energy resin, 30 parts of carbon powder; Nano photocatalyst and first The solvents are mixed, and then stirred at a temperature of 45° C. and a rotation speed of 1200 r / min for 45 minutes to obtain a first mixture, and polyvinylidene fluoride, a second solvent and a diluent are added to the first mixture, and at a temperature of 45 ℃, stirring at a speed of 900r / min for 45min to obtain the second mixture. Add a low surface energy resin to the second mixture and stir for 45min at a temperature of 90℃ to obtain the third mixture. In the third mixture Add charcoal powder, stir at 105°C for 60 minutes, then lower the temperature to 70°C, evaporate for 3 hours, then apply a thin layer and bake at 35°C.
[0032] Table I
[0033]
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