Unlock instant, AI-driven research and patent intelligence for your innovation.

Optical lens system, exposure device, exposure method and manufacturing method of element

An optical lens, lens technology, applied in the field of optical lens system, to achieve good imaging quality, improve aberration problem, high resolution effect

Active Publication Date: 2019-04-16
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide an optical lens system to solve the following problems in current packaging lithography equipment: how to achieve higher resolution requirements; how to make the same packaging lithography equipment adapt to different resolution requirements ; and how to avoid the problems caused by using mercury lamps as the light source and optimize the image quality results

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical lens system, exposure device, exposure method and manufacturing method of element
  • Optical lens system, exposure device, exposure method and manufacturing method of element
  • Optical lens system, exposure device, exposure method and manufacturing method of element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Embodiment 1 provides a specific implementation manner of an optical lens system. figure 1 and figure 2 They are respectively a structural schematic diagram of an optical lens system and a schematic diagram of an optical path when the numerical apertures are 0.24 and 0.16 in Embodiment 1 of the present invention. The following specific reference figure 1 and figure 2 As shown, Embodiment 1 of the present invention will be described in detail.

[0040] An optical lens system, comprising a first lens group 100, a second lens group 200, a third lens group 300 and a fourth lens group sequentially arranged along the optical axis direction of the optical lens system from an object region to an image region 400;

[0041] Wherein, the first lens group 100 at least has a meniscus lens 103, a biconvex lens 105 and a biconcave lens 107 arranged sequentially from the object region to the image region;

[0042] The second lens group 200 at least has a concave lens 201 and a c...

Embodiment 2

[0097] The present invention also provides an exposure device, Figure 12 It is a schematic structural diagram of the exposure device in the second embodiment, for details, refer to Figure 12 As shown, the exposure device includes a light source module 1 , an illumination module 2 , a mask stage 3 , an optical lens assembly 4 and a workbench 5 .

[0098] Specifically, the light source module 1 projects a light source onto the mask stage 3 through the illumination module 2, the light source passing through the mask stage 3 illuminates the optical lens assembly 4, and the The light source of the optical lens assembly 4 irradiates onto the base supported by the workbench 5, wherein the optical lens assembly 4 adopts the optical lens system provided by the present invention.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
refractive indexaaaaaaaaaa
refractive indexaaaaaaaaaa
refractive indexaaaaaaaaaa
Login to View More

Abstract

The invention provides an optical lens system, an exposure device, an exposure method and a manufacturing method of an element. The optical lens system comprises a first lens group, a second lens group, a third lens group and a fourth lens group which are sequentially arranged from an object region to an image region along the optical axis direction of the optical lens system, wherein the first lens group at least comprises a meniscus lens, a convex lens and a biconcave lens which are sequentially arranged from an object area to an image area; the second lens group is at least provided with aconcave lens and a convex lens which are sequentially arranged from the object area to the image area. According to the optical lens system provided by the invention, through selection and combinationof the lenses in the first lens group and the second lens group, the numerical aperture is improved, and the optical lens system has higher resolution, for example, when the optical lens system is applied to a photoetching process, the limit resolution reaches 750 nm. Furthermore, by adopting the exposure device and the exposure method of the optical lens system and the manufacturing method of the element provided by the invention, a process with higher resolution can be realized.

Description

technical field [0001] The invention relates to the field of semiconductor preparation, in particular to an optical lens system, an exposure device, an exposure method and a manufacturing method of an element. Background technique [0002] With the development of semiconductor technology, the size of semiconductor devices continues to shrink. Correspondingly, higher requirements are put forward for various preparation processes in the field of semiconductor preparation. Further, higher-precision process equipment is required to meet the requirements of the preparation process. high requirements. [0003] At present, in the back-end packaging process of semiconductor processing and manufacturing, the requirements for photolithography process resolution are getting higher and higher, from the previous common 3 μm to 10 μm, to 1 μm to 3 μm, and there are even process requirements below 1 μm. However, the highest resolution that can be achieved by packaging lithography equipmen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70241
Inventor 孙晶露田毅强
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD