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Klystron permanent magnetic focusing system

A technology of permanent magnet focusing and focusing system, which is applied in the direction of discharge tubes, transit time electron tubes, electrical components, etc. It can solve problems such as electron divergence, klystron damage, and difficulty in focusing electrons, so as to save workload and achieve high efficiency. The effect of flow rate and ease of assembly

Active Publication Date: 2019-05-21
NO 12 RES INST OF CETC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the energy of this part of electrons exceeds the tolerance range of the klystron, it will cause damage to the klystron
At present, the working frequency band of the klystron is getting higher and higher, especially for the klystron with the working frequency above the millimeter level (≥30GHz), the high frequency size is millimeter level, and the diameter and length of the electronic injection channel are limited.
However, in the electron beam channel with smaller diameter and longer length, it is often more difficult for the electron beam to focus, and a large part of the electrons will diverge, thus hitting the inner wall of the klystron, reducing the working efficiency of the klystron, and even affecting klystron damage

Method used

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  • Klystron permanent magnetic focusing system

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Effect test

Embodiment 1

[0028]In the focusing system of the preferred embodiment of the present invention, the focusing system includes an electron gun permanent magnet assembly, which sequentially includes an upper magnetic screen with an opening at its center, an upper magnetic ring, and an upper magnetic steel outer ring; the collector pole permanent magnet assembly sequentially includes The lower magnetic screen, the lower magnetic ring and the lower magnetic steel outer ring with openings are formed in the center, and the outer ring transition ring is arranged between the upper magnetic steel outer ring and the lower magnetic steel outer ring, wherein the upper magnetic screen and the lower magnetic steel outer ring The length between them is set to 10mm, the diameter of the electronic injection channel is 0.3mm, the diameter of the opening of the lower magnetic shield is 1.3mm, the ratio of the outer diameter to the inner diameter of the upper magnetic ring is 1.5:1-3:1; the lower magnetic ring ...

Embodiment 2

[0030] In the focusing system of another preferred embodiment of the present invention, the focusing system includes an electron gun permanent magnet assembly, which sequentially includes an upper magnetic screen with an opening formed in its center, an upper magnetic ring, and an upper magnetic steel outer ring; the collector permanent magnet assembly, It includes the lower magnetic screen, the lower magnetic ring and the lower magnetic steel outer ring with an opening formed in its center in turn, and the outer ring transition ring arranged between the upper magnetic steel outer ring and the lower magnetic steel outer ring, wherein the upper magnetic screen and the lower magnetic steel The length between the screens is set to 20mm, the diameter of the electronic injection channel is 0.5mm, the ratio of the outer diameter to the inner diameter of the upper magnetic ring is 1.5:1-3:1; the ratio of the outer diameter to the inner diameter of the lower magnetic ring is 1.5 :1-3:1...

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Abstract

The invention discloses a klystron permanent magnetic focusing system. The permanent magnetic focusing system comprises an electronic gun permanent magnetic component which orderly comprises an uppermagnetic screen formed with an opening at the center, an upper magnetic ring and an upper magnetic steel outer ring; a collector permanent magnetic component orderly including a lower magnetic screenformed with an opening at the center, a lower magnetic ring and a lower magnetic steel outer ring, wherein magnetizing directions of the lower magnetic ring and the upper magnetic ring are opposite; and an outer ring transition ring arranged between the upper magnetic steel outer ring and the lower magnetic steel outer ring, wherein the electronic gun permanent magnet component and the collector permanent magnet module are arranged so that the axial magnetic field strength at the center of an electronic injection channel is less than and equal to 1.2T. The permanent magnet focusing system provided by the invention can form an axial uniform magnetic field (the magnetic field strength is not more than 1.2T) at the electronic injection channel; and meanwhile, the structure enables the electronic injection focusing effect to be better, thereby guaranteeing the electronic injection focusing in the electronic injection channel with diameter of 0.3-0.5mm and length not more than 20mm.

Description

technical field [0001] The invention relates to the field of klystron tooling design, in particular to a klystron permanent magnet focusing system. Background technique [0002] The klystron is a power amplifier device that converts the kinetic energy of the electron beam into microwave energy by using the interaction between the high-speed electron beam and the microwave signal. Klystrons are widely used in missile homing, aerospace measurement and control, target imaging, weather detection, electronic countermeasures and other electronic systems, and are the core power devices of radar systems. One or several klystrons are usually used as the final power amplifier in the radar system. [0003] The interaction of the klystron occurs in the high-frequency interaction system. The electron beam needs to be focused when passing through the high-frequency interaction system, otherwise the electron beam will immediately diverge due to the repulsion between the electrons and cann...

Claims

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Application Information

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IPC IPC(8): H01J23/087
Inventor 韦莹李冬凤周军杨继涛殷亮窦钺欧阳佳佳
Owner NO 12 RES INST OF CETC