Gallium nitride lateral transistor with AlGaN/GaN heterojunction and manufacturing method of gallium nitride lateral transistor
A lateral transistor and heterojunction technology, which is applied in the manufacture of semiconductor/solid-state devices, semiconductor devices, electrical components, etc., can solve the difficulties of AlGaN/GaN heterojunction transistors, etc., and achieve the effect of improving performance and reducing peak electric field.
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[0036] The present invention will be described below by taking a novel gallium nitride lateral transistor with an N-channel AlGaN / GaN heterojunction as an example in conjunction with the accompanying drawings.
[0037] Such as figure 1 As shown, the structure of this embodiment includes:
[0038] Substrates of semiconductor materials;
[0039] a drift region located on the surface of the substrate;
[0040] A base region, a source region, and a channel substrate contact formed by ion implantation based on one end of the drift region; the surface of the base region is covered with a gate dielectric layer;
[0041] A drain region formed by ion implantation based on the other end of the drift region;
[0042] Wherein, the substrate is a P-type GaN material, and the drift region is an N-type GaN material; a P-type shielding layer is also formed by ion implantation at the base region, the source region, and the substrate below the channel substrate contact;
[0043] The surface...
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