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Optical multi-arc ion plating method and device thereof

A multi-arc ion plating and optical technology, applied in ion implantation plating, sputtering plating, vacuum evaporation plating, etc., can solve the problems of high production cost, inconsistent thickness, large thickness gap, etc., and achieve metal ionization rate High, broad application prospects, uniform coating etching effect

Inactive Publication Date: 2019-06-25
XIANGTAN HONGDA VACUUM TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] In the multi-arc ion plating method and equipment of the prior art, multiple multi-arc targets are arranged in groups, and the internal targets are installed in dislocations. This distance will cause the position of the target of the multi-arc target to be directly facing the workpiece than the side position. The thickness of the workpiece rubbing is inconsistent, and the thickness gap is large. Even if the workpiece bias is used to increase the uniformity of the thickness, the actual effect is not ideal. It can only be coated by multi-arc coating and then magnetron sputtering. To ensure uniformity, but this leads to low production efficiency and high production costs

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  • Optical multi-arc ion plating method and device thereof

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Embodiment Construction

[0035] The present invention will be further described in detail and completely below in conjunction with the embodiments and the accompanying drawings.

[0036] Such as figure 1 with figure 2 As shown, in this embodiment, the optical multi-arc ion plating method provided by the present invention includes the following steps:

[0037] Step a) the substrate is transported into the vacuum chamber;

[0038] Step b) using a multi-arc target to perform optical multi-arc ion plating on the substrate in the vacuum chamber;

[0039] Step c) the substrate is transported out of the vacuum chamber after optical multi-arc ion plating;

[0040] The multi-arc target includes a cathode 1 and an arc electrode 2. One end of the cathode 1 is insulated and connected to one end of the arc electrode 2. The cathode 1 is a target with a magnetic bar 11 and a target back tube inside. The magnetic bar 11 and the target back The tubes are arranged adjacent to each other. The magnetic rod 11 is an ...

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Abstract

The invention discloses an optical multi-arc ion plating method. The optical multi-arc ion plating method comprises the following steps that (a) a substrate is transferred into a vacuum chamber; (b) optical multi-arc ion plating is carried out on the substrate by adopting a multi-arc target in the vacuum chamber; and (c) optical multi-arc ion plating is carried out on the substrate, and then the substrate is transferred out of the vacuum chamber. The multi-arc target comprises a cathode and an arc striking electrode, wherein one end of the cathode is insulation joint with one end of the arc striking electrode; the cathode is a target with a magnetic rod and a target back pipe arranged in the cathode; the magnetic rod and the target back pipe are arranged adjacent to each other; the magnetic rod is an insulating rod embedded with a magnetic assembly; and the arc striking electrode is controlled to be in contact and to be separated with the surface of the cathode at the end which is notconnected with the cathode through an electromagnetic valve. Compared with the prior art, according to the optical multi-arc ion plating method, the magnetic assembly is additionally arranged in the cathode, so that the metal ionization rate is higher, a plating film is etched uniformly, and the uniformity of a film layer on the surface of the substrate is better, so that the application prospectis very wide.

Description

technical field [0001] The invention relates to the field of vacuum coating, in particular to an optical multi-arc ion plating method and a device thereof. Background technique [0002] Vacuum coating technology first appeared in the 1930s, industrial applications began to appear in the 1940s and 1950s, and industrial mass production began in the 1980s. It has been widely used in electronics, aerospace, packaging, decoration, hot stamping and printing industries. Vacuum coating technology is a novel new technology of material synthesis and processing, and is an important part of the field of surface engineering technology. Vacuum coating technology is to use physical and chemical means to coat the solid surface with a layer of coating with special properties, so that the solid surface has wear resistance, high temperature resistance, corrosion resistance, oxidation resistance, radiation protection, electrical conductivity, magnetic conductivity, insulation and decoration. M...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32
Inventor 祝海生孙桂红陈立凌云黄夏黄国兴
Owner XIANGTAN HONGDA VACUUM TECH CO LTD