Optical multi-arc ion plating method and device thereof
A multi-arc ion plating and optical technology, applied in ion implantation plating, sputtering plating, vacuum evaporation plating, etc., can solve the problems of high production cost, inconsistent thickness, large thickness gap, etc., and achieve metal ionization rate High, broad application prospects, uniform coating etching effect
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[0035] The present invention will be further described in detail and completely below in conjunction with the embodiments and the accompanying drawings.
[0036] Such as figure 1 with figure 2 As shown, in this embodiment, the optical multi-arc ion plating method provided by the present invention includes the following steps:
[0037] Step a) the substrate is transported into the vacuum chamber;
[0038] Step b) using a multi-arc target to perform optical multi-arc ion plating on the substrate in the vacuum chamber;
[0039] Step c) the substrate is transported out of the vacuum chamber after optical multi-arc ion plating;
[0040] The multi-arc target includes a cathode 1 and an arc electrode 2. One end of the cathode 1 is insulated and connected to one end of the arc electrode 2. The cathode 1 is a target with a magnetic bar 11 and a target back tube inside. The magnetic bar 11 and the target back The tubes are arranged adjacent to each other. The magnetic rod 11 is an ...
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