Preparation method of anisotropic stacked graphene
A graphene and heterosexual technology, which is applied in the field of preparation of heterogeneous stacked graphene, can solve the problems of device application preparation influence, complicated process, unfavorable graphene industrial production, etc., and achieve the effect of industrial application
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Embodiment 1
[0042] see figure 1 , the present embodiment demonstrates a kind of preparation method of heterosexually stacked graphene, comprises the following steps:
[0043] Step ①: Prepare an insulating or semiconductor substrate.
[0044] Step ②: Prepare a layered distribution of nickel layer and doped carbon source layer on the surface of the substrate, and make the nickel layer and doped carbon source layer directly contact.
[0045] In this embodiment, the doped carbon source layer includes a carbon source layer and a doped layer, and the carbon source layer is located between the doped layer and the nickel layer.
[0046] The specific preparation method of the nickel layer and the doped carbon source layer is as follows: the surface of the substrate is first spin-coated with a doping liquid to form a doped layer, then spin-coated with a carbon source liquid to form a carbon source layer, and finally electron beam evaporates Ni on the surface of the carbon source layer. A nickel l...
Embodiment 2
[0055] This embodiment demonstrates a kind of preparation method of heterosexually stacked graphene, comprises the following steps:
[0056] Step ①: Prepare an insulating or semiconductor substrate.
[0057] Step ②: Prepare a layered distribution of nickel layer and doped carbon source layer on the surface of the substrate, and make the nickel layer and doped carbon source layer directly contact.
[0058] The specific preparation method of the nickel layer and the doped carbon source layer is as follows: electron beam evaporation is performed on the surface of the substrate to form the nickel layer. The doping liquid and the carbon source liquid are mixed and spin-coated onto the surface of the nickel layer to form a doped carbon source layer.
[0059] Step ③: heating the doped carbon source layer, so that carbon is incorporated into the nickel layer, and then cooling down, so that one side of the nickel layer grows doped graphene, and the other side grows pure graphene.
[...
Embodiment 3
[0063] The difference between this embodiment and embodiment 1 is that: after step ④ is completed, step ②, step ③ and step ④ are repeated. Reciprocate in this way to form a periodic layered structure of substrate, doped graphene, pure graphene, doped graphene, and pure graphene.
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