Super-resolution defect detecting device and detecting method based on super-oscillation lens

Abstract

The invention discloses a super-resolution defect detecting device and detecting method based on a super-oscillation lens. A workpiece table, a vacuum adsorption device, a substrate, a semi-transparent and semi-reflective mirror group, a laser light source, a collimating lens, an objective lens, a CCD, a piezoelectric motor, a linear motor, an upper computer and the like are used, so that a collimated laser light is irradiated to the semi-transparent and semi-reflective mirror group; the semi-transparent and semi-reflective mirror group reflects the laser light onto the substrate first; then the light reflected from the surface of the substrate passes through the semi-transparent and semi-reflective mirror, and then converges on the CCD through a specially optimized super-oscillation lens;and the process of automatic focusing is completed by using an image acquired by the CCD and a program in the host computer, and finally the defect detection of the substrate below 100 nm is realized. The super-resolution defect detecting device and detecting method based on the super-oscillation lens can be used for the detection of substrate defects in a lithography machine, and improves the yield of the lithography machine in actual industrial production.

Description

technical field [0001] The invention belongs to the field of microscopic imaging and micro-nano optics, and in particular relates to a super-resolution defect detection device and detection method based on a super-oscillation lens. Background technique [0002] In the process of modern semiconductor lithography, the surface quality of the substrate is one of the key factors determining the quality of the product. The main hazards of substrate defects are scattering, energy absorption, harmful flares, diffraction fringes, film damage, etc., which will affect the performance and normal operation of the system. If the surface quality problem of the substrate cannot be found in time and the process is adjusted in time, the loss will be very large, and the previous work on the substrate to be completed will be wasted. If the quality of the substrate surface can be detected in real time during the manufacturing process and fed back to the control system in time, and the entire pr...

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is: to overcome the problem of insufficient resolution of the existing defect detection technology, a super-resolution imaging method based on a super-oscillating lens is proposed, and the design of super-resolution defect detection equipment is completed in combination with the autofocus system , improving the accuracy of substrate defect detection in the semiconductor processing industry

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