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Preparation method of two-dimensional ternary atomic crystal

An atomic and crystal technology, applied in the field of nanomaterial preparation, can solve the problems of strong processing conditions, defective oxygen atoms, and easy damage to samples, and achieve the effects of large size, fast growth rate, and good uniformity.

Active Publication Date: 2020-11-20
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, these methods cannot be completed at the same time during the sample preparation process, and the sample needs to be processed multiple times, and the processing conditions are strong and the controllability is not high, and the sample is easily damaged, resulting in defects or absorbing excess oxygen atoms.

Method used

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  • Preparation method of two-dimensional ternary atomic crystal
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  • Preparation method of two-dimensional ternary atomic crystal

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Embodiment Construction

[0037] The present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the described embodiments are only some of the embodiments of the application, and the application is not limited to the embodiments described here.

[0038] There are many methods for doping oxygen in two-dimensional ternary atomic crystals, including oxygen plasma bombardment, electrochemical exfoliation, and high-temperature thermal annealing. However, these methods cannot be completed at the same time during the sample preparation process, and the samples need to be processed multiple times, and the processing conditions are strong and the controllability is not high, and the samples are easy to be damaged and produce defects or absorb excess oxygen atoms.

[0039] The present invention utilizes chemical vapor deposition to prepare two-dimensional ternary atomic crystals. Specifically, molybdenum oxysu...

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Abstract

The invention relates to a method for preparing a two-dimensional ternary atomic crystal. The method comprises the following steps: placing a substrate in a chemical vapor deposition system, introducing argon-oxygen mixed gas, heating to a certain temperature for a period of time, and carrying out annealing treatment to enable the substrate to generate a periodic step; sequentially placing the tworeaction sources and the annealed substrate in a certain proportion in a first temperature zone, a second temperature zone and a third temperature zone of a chemical vapor deposition system; introducing carrier gas and continuously introducing a certain flow of oxygen, respectively heating the temperatures of the three temperature zones under a certain air pressure for a period of time to form the two-dimensional ternary atomic crystal MXO. The epitaxial growth method provided by the invention is simple, rapid and low in cost, and the prepared single crystal film is clean and nondestructive,has excellent properties, and can be used for preparing high-performance electronic devices and photoelectric devices and used for electrocatalysis.

Description

technical field [0001] The present invention generally relates to the technical field of nanomaterial preparation, and more particularly relates to a method for preparing two-dimensional materials, especially two-dimensional ternary atomic crystals, by chemical vapor deposition. Background technique [0002] Since the discovery of graphene, two-dimensional materials have attracted great attention. Two-dimensional materials have the thickness of a single atomic layer and can be used to study basic scientific issues in low-dimensional constrained systems. They are also important research objects in information, energy, biomedicine and other application fields. In particular, transition metal chalcogenides, as semiconductor materials with excellent properties, are ideal materials for building the next generation of lighter, thinner, faster, and more sensitive electronic and optoelectronic devices. Among them, the widely studied molybdenum disulfide is a typical transition meta...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B29/46C30B25/02C30B25/14
CPCC30B25/02C30B25/14C30B29/46
Inventor 魏争汤建张广宇时东霞杨蓉
Owner INST OF PHYSICS - CHINESE ACAD OF SCI
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