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Molybdenum disulfide/Sn co-doping composite film on base body surface and preparing method thereof

A technology of molybdenum disulfide and composite thin film, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of reduced wear resistance, loss of lubrication effect, etc., and achieve the effect of improving the bonding force of the film base

Inactive Publication Date: 2019-09-03
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Molybdenum disulfide (MoS 2 ) is a typical solid lubricant, but MoS 2 Extremely sensitive to heat and humidity, in low humidity environment, MoS 2 The friction coefficient of MoS is about 0.05 to 0.08. When the humidity reaches above 70%, MoS 2 The friction coefficient increases to more than 0.2, and the wear resistance is also significantly reduced, and the lubrication effect is often lost after more than a thousand cycles.

Method used

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  • Molybdenum disulfide/Sn co-doping composite film on base body surface and preparing method thereof
  • Molybdenum disulfide/Sn co-doping composite film on base body surface and preparing method thereof
  • Molybdenum disulfide/Sn co-doping composite film on base body surface and preparing method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0045] In this embodiment, the substrate material is 304 stainless steel, and the composite film on the surface of the substrate has a multi-layer structure, and its composition is: from the surface of the substrate along the thickness direction: a Ti transition layer with a thickness of 200nm, a Ti transition layer with a thickness of 50nm and MoS 2 A gradient transition layer with a thickness of 3.5 μm in MoS 2 Floor.

[0046] The composite film is prepared by magnetron sputtering technology, which mainly includes the following steps:

[0047] (1) Perform mechanical polishing on the surface of the substrate, put the substrate material in an acetone solution for 30 minutes of ultrasonic cleaning, blow dry with nitrogen, put it in absolute ethanol solution for 30 minutes of ultrasonic cleaning, blow dry with nitrogen and take it out.

[0048] (2) Put the substrate cleaned in step (1) into the magnetron sputtering chamber, and vacuum the chamber until the vacuum degree is low...

Embodiment 2

[0054] In this embodiment, the substrate material is 304 stainless steel, and the composite film on the surface of the substrate has a multi-layer structure. From the surface of the substrate along the thickness direction, its composition is as follows: Ti bonding layer with a thickness of 200nm, Ti and MoS with a thickness of 50nm. 2 Gradient transition layer with Sn, MoS with a thickness of 3.5 μm 2 Co-doped layer with Sn. In this embodiment, the atomic percentage of Sn in the composite film is 1.8%.

[0055] The composite film is prepared by magnetron sputtering technology, which mainly includes the following steps:

[0056] (1) Perform mechanical polishing on the surface of the substrate, put the substrate material in an acetone solution for 30 minutes of ultrasonic cleaning, blow dry with nitrogen, put it in absolute ethanol solution for 30 minutes of ultrasonic cleaning, blow dry with nitrogen and take it out.

[0057] (2) Put the substrate cleaned in step (1) into the...

Embodiment 3

[0063] In this embodiment, the matrix and the composite film on the surface of the matrix are basically the same as in Example 1, except that the atomic percentage of Sn in the composite film is 2.5%.

[0064] In the present embodiment, the preparation method of the composite film is basically the same as in Example 1, except that steps (3-2) and (3-3) are as follows:

[0065] (3-2) Enable MoS 2 target sputtering current, and gradually increase the MoS 2 Target sputtering current to 1.6A; at the same time, turn on the Sn target sputtering current, and gradually increase the Sn target sputtering current to 0.4A; at the same time, gradually reduce the Ti target sputtering current to 0A, and the working pressure is 0.1-1.0Pa , the bias voltage is -30~-70V, and the gradient transition layer is deposited on the surface of the Ti bonding layer;

[0066] (3-3) Keep MoS 2 The target sputtering current was 1.6A, the Sn target sputtering current was 0.4A respectively, and the co-dope...

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Abstract

The invention provides a molybdenum disulfide / Sn co-doping composite film on a base body surface and a preparing method thereof. The composite film sequentially comprises a Ti transition layer, a Ti,MoS2 and Sn gradient transition layer and an MoS2 and Sn co-doping layer from the base body surface in the thickness direction; the composite film has the good mechanical property, the friction wear property, and the damp heat resistance property, particularly, through regulation of Sn content, the hardness and the friction wear properties of the composite film can be regulated, and the compositefilm can be applied to the high humidity atmosphere environment.

Description

technical field [0001] The invention belongs to the technical field of surface treatment, and in particular relates to a molybdenum disulfide / tin co-doped composite film on the surface of a substrate and a preparation method thereof. Background technique [0002] With the development of industry, the friction and wear between a large number of moving parts of mechanical equipment makes the performance and life of mechanical equipment plummet, resulting in huge material and energy losses. Friction and wear account for 30%-50% of the world's energy. At the same time, mechanical accidents caused by friction and wear account for 80% of the total mechanical accidents. [0003] Traditional lubrication is mainly based on liquid lubricants and lubricants, but liquid lubricants are not suitable for some special application environments such as high vacuum, high humidity, high and low temperature. In order to meet the lubrication requirements of special environments, solid lubricati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/16C23C14/06C23C14/35C23C14/54
CPCC23C14/025C23C14/0623C23C14/165C23C14/352C23C14/548
Inventor 蒲吉斌柏一舟王立平王海新薛群基
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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