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Display substrate and manufacturing method thereof, display panel and display device

A technology for a display substrate and a manufacturing method is applied in the fields of display panels, display devices, display substrates and manufacturing methods thereof, and can solve the problems affecting the yield rate of the display panel, the difficulty of proceeding in the process, and the uneven coating of photoresist on a flat layer. , to achieve the effect of improving yield, fast coating speed and uniform coating

Active Publication Date: 2021-10-01
BOE TECH GRP CO LTD
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  • Claims
  • Application Information

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Problems solved by technology

[0004] The present invention provides a display substrate and a manufacturing method thereof, a display panel and a display device to solve the problem of uneven coating of photoresist on the flat layer during the manufacturing process of the existing display substrate, which makes it difficult to carry out subsequent processes and affects the display. The problem of the yield rate of the panel

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  • Display substrate and manufacturing method thereof, display panel and display device
  • Display substrate and manufacturing method thereof, display panel and display device
  • Display substrate and manufacturing method thereof, display panel and display device

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Embodiment Construction

[0051] In order to make the above objects, features, and advantages of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0052] At present, when an inkjet printing process is made on the display substrate, it is often necessary to display a substrate having good flatness. During the actual production process, in order to reduce the IR DROP (pressure drop) of the large size display panel, it is necessary to increase the film. The thickness of the source or drain of the transistor, so that the film layer difference between the display substrate is increased, resulting in a decrease in flatness, in order to improve the flatness of the display substrate, it is necessary to increase the thickness of the flat layer; in addition, in order to improve the source or drain and anode The capacitance between the parasitic capacitance is also needed to increase the thickness of the flat ...

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Abstract

The invention provides a display substrate and a manufacturing method thereof, a display panel and a display device, and relates to the field of display technology. In the present invention, a thin film transistor is formed on a base substrate, a passivation layer and a flat layer are sequentially formed, a metal mask layer is formed on the flat layer, and the metal mask layer is patterned to form holes to be etched. The etch hole etches the exposed planar layer and passivation layer in a direction perpendicular to the base substrate to form a via hole penetrating through the planar layer and passivation layer, and removes the remaining metal mask layer on the planar layer. By adding a metal mask layer on the flat layer, when the metal mask layer is patterned to form holes to be etched, the photoresist coated on the metal mask layer is relatively uniform, and the formed holes to be etched There will be no incomplete etching or over-etching phenomenon, and there will be no incomplete etching or over-etching phenomenon when forming a via hole through the flat layer and passivation layer through the hole to be etched, which improves the display panel yield.

Description

Technical field [0001] The present invention relates to the field of display technology, and more particularly to a display substrate and a manufacturing method thereof, a display panel, and a display device. Background technique [0002] With the continuous development of the display technology, the display product gradually develops in the direction of high resolution, high-color gamut, high-quality and high-life, and the OLD (Organic Light Emitting Diode, Organic Light Emitting Diode) formed by inkjet printing processes. The panel has a better performance and life advantage with respect to the OLED display panel formed by the vapor deposition process, especially for large-sized display products. [0003] At present, the thickness of the flat layer in the substrate is large, in order to form a via through the flat layer, the larger the thickness of the photoresist coated on the flat layer, and the thickness of the photoresist is uneven. Thus, it is prone to the formation of inc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L27/12H01L21/033H01L21/027H01L27/32
CPCH01L21/0332H01L21/0274H01L27/1288H01L27/124H10K59/124H01L21/31144H01L21/31116H01L21/32134H01L29/78633H01L29/7869H01L27/1225H01L21/76804H10K59/123H01L27/1248
Inventor 张建业
Owner BOE TECH GRP CO LTD
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