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Optically uniform transparent conductive film and preparation method thereof

A transparent conductive film, optical technology, applied in optics, equipment for manufacturing conductive/semi-conductive layers, optical components, etc., can solve the problems of obvious etching marks, easy corrosion of metal materials, poor light stability, etc.

Active Publication Date: 2019-11-05
江苏纳美达光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The invention provides an optically consistent transparent conductive film, which aims to solve the problems of obvious etching marks, poor light stability, easy corrosion of metal materials and migration of metal ions after the metal nanowire conductive film is processed, so as to meet the needs of various back-end applications

Method used

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  • Optically uniform transparent conductive film and preparation method thereof
  • Optically uniform transparent conductive film and preparation method thereof
  • Optically uniform transparent conductive film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0115] S1, will include 0.01% of nanoparticle B, 0.2% of high viscosity cellulose HPMC as film-forming agent, 0.01% of leveling agent DOW CORNING DC-57, 1% of metal nanowire A and 98.78% of solvent ( Including water, ethanol and isopropanol) mixed uniformly to form a conductive ink; S2, using a slit coating method to coat a conductive ink on a substrate to form a conductive layer; S3, will include 0.02% dendrimer polyamide amine (PAMAM), 0.5% trimethylolpropane trimethacrylate (TMPTMA), 0.2% 1,6-hexanediol diacrylate (HDDA), 0.1% phenoxyethyl acrylate (PHEA ), 0.15% UV absorber BASF Tinuvin 234, 0.09% cellulose acetate butyrate (CAB), 0.08% antioxidant Irganox 1098, 8% diacetone alcohol, 83.51% isopropanol, 7% ethanol , 0.3% photoinitiator DAROCUR1173 and 0.05% IRGACURE2595 are mixed evenly to form a protective layer formula liquid; S4, coating the protective liquid on the surface of the conductive layer, and forming a protective layer after thermal curing or UV curing. Final...

Embodiment 2

[0117] S1, including 0.01% of nanoparticle B, 0.2% of high viscosity cellulose CMC as a film-forming agent, 0.01% of leveling agent DOW CORNING DC-57, 1.5% of metal nanowire A and 98.28% of solvent ( Including water, ethanol and isopropanol) mixed uniformly to form a conductive ink; S2, using a slit coating method to coat a conductive ink on a substrate to form a conductive layer; S3, including 0.01% dendrimer hydroxyl modified Dendritic polyamidoamine (PAMAM-OH), 0.01% ammonia carboxyl complexing agent is ethylenediaminetetraacetic acid (EDTA), 0.8% trimethylolpropane triacrylate (TMPTA), 0.2% 1,6 -Hexanediol diacrylate (HDDA), 0.1% phenoxyethyl acrylate (PHEA), 0.15% UV absorber BASFTinuvin 234, 0.3% cellulose acetate butyrate (CAB), 0.08% anti Oxidant Irganox 1010, 8% diacetone alcohol, 83% isopropanol, 7% ethanol, 0.3% initiator DAROCUR 1173 and 0.05% IRGACURE 2595 are mixed evenly to form a protective layer formula liquid; S4, on the conductive layer The surface is coate...

Embodiment 3

[0119] S1, will include 0.5% of nanoparticles B, 0.8% of high-viscosity cellulose HPMC as a film-forming agent, 0.1% of leveling agent TEGO Glide 410, 1% of metal nanowires A and 97.6% of solvents (including water , ethanol and isopropanol) are mixed evenly to form conductive ink; S2, using slit coating method to coat conductive ink on the substrate to form a conductive layer, such as Figure 5 As shown, metal nanowires A12 and nanoparticles B13 are uniformly distributed on the surface of the substrate to form a planar conductive network; S3, conduct infrared radiation treatment, microwave radiation treatment, xenon lamp pulse treatment, and photon sintering treatment on the conductive layer, and after adjusting the post-treatment Parameters, such as frequency, energy, and processing time, make part of the nanoparticles B in the conductive layer melt and grow secondary, act as a medium, and weld the metal nanowires A, such as Figure 6 a and 6b, as Figure 6 As shown in a, be...

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Abstract

The invention discloses an optically uniform transparent conductive film and a preparation method thereof, and solves the problems of obvious etching mark after post-processing of the metal nanowire transparent conductive film, poor light stability, easy corrosion of nano-materials and migration of metal ions. The problem of obvious etching mark after post-processing of the metal nanowire conductive film can be solved by adding nano-particles with matching refractive index and high corrosion resistance, adding an optical compensation layer and using a substrate with an anti-glare layer. The transparent conductive film with complete plate conduction is provided by using an electrical compensation layer so as to improve the corrosion resistance. The photostability of the conductive film is improved by adding an ultraviolet stabilizer to the protective solution. The antioxidants, dendrimers and complexing agents in the protective solution solve the problems of corrosion of nano-materialsand migration of the metal ions.

Description

technical field [0001] The invention relates to the technical field of transparent conductive films, in particular to an optically consistent transparent conductive film. It can be used in the electronics industry, such as rigid or flexible touch screens, rigid or flexible displays, mobile phone antenna circuits, infrared optical imaging components, photoelectric sensors, electromagnetic shielding, smart windows, smart writing tablets, solar cells, etc. Background technique [0002] Transparent conductive film refers to a film that is both conductive and has high light transmittance in the visible light range. It is used in rigid or flexible touch screens, rigid or flexible displays, mobile phone antenna circuits, infrared optical imaging components, photoelectric sensors, and electromagnetic shielding. , smart windows, smart tablet, solar cells, etc. have broad application prospects. [0003] Indium tin oxide (ITO) is currently the most commonly used material. Because of i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14H01B13/00
CPCH01B5/14H01B13/0026H10K50/828H01L31/022466G06F3/044G06F2203/04103G06F2203/04112H10K71/60H10K30/82H10K2102/101H10K2102/331G02B1/14B05D1/26B05D3/0254B05D3/06B05D3/067B05D3/142B05D7/54G02B1/11
Inventor 刘腾蛟苏燕平李鑫胡源
Owner 江苏纳美达光电科技有限公司
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