Multistage ionization rotating magnetic field acceleration spiral wave plasma source

A plasma source and rotating magnetic field technology, applied in the direction of plasma, electrical components, etc., can solve the problems of high processing precision of electrostatic gate, reduce the service life of plasma source, restrict the service life of plasma source, etc., and achieve electrodeless design , Various propellants, the effect of increasing density

Active Publication Date: 2019-12-06
BEIHANG UNIV
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Problems solved by technology

The use of ion cyclotron resonance acceleration requires a super-strong magnetic field structure, which greatly increases the complexity of the system, and its resonance effect is uncertain and difficult to evaluate
Second-order helicon wave plasma sources that use electrostatic grid acceleration or Hall electromagnetic acceleration re

Method used

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  • Multistage ionization rotating magnetic field acceleration spiral wave plasma source
  • Multistage ionization rotating magnetic field acceleration spiral wave plasma source

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Embodiment Construction

[0026] The present invention will be further described below in conjunction with the accompanying drawings and examples. It should be understood that the following examples are intended to facilitate the understanding of the present invention, and have no limiting effect on it.

[0027] Such as figure 1 As shown, the multi-stage ionized rotating magnetic field accelerated helicon wave plasma source of the present invention includes a discharge chamber 1, a first-stage helicoid antenna 2, a first-stage helicoid magnetic coil 3, a second-stage helicoid antenna 4, a second-stage The helical wave magnetic coil 5 , the magnetic mirror structure and the rotating magnetic field acceleration coil 8 , the magnetic mirror structure includes the first-stage magnetic confinement magnetic coil 6 and the second-stage magnetic confinement magnetic coil 7 . Among them, the discharge chamber 1, the first-stage helical wave antenna 2, the first-stage helical wave magnetic coil 3, the second-sta...

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Abstract

The invention discloses a multistage ionization rotating magnetic field acceleration spiral wave plasma source, and the plasma source uses spiral wave discharge plasma as a plasma first-order ionization source, uses a multistage stepped contraction ionization structure, and uses a magnetic confinement structure and a rotating magnetic field acceleration structure to accelerate the plasma. According to the invention, the ionization rate and the plasma density of a plasma source propellant are improved through the multi-step ionization technology; the magnetic confinement and rotating magnetic field acceleration structure is used for accelerating the plasma, and the ejection speed of the plasma is increased; in addition, the overall structural design does not need discharge electrodes, neutralizers and other parts which are prone to corrosion and seriously restrict the service life of the plasma source, and then the performance and the service life of the plasma source are improved.

Description

technical field [0001] The invention belongs to the field of plasma sources, and in particular relates to a plasma that uses helicon discharge plasma as the first-order ionization source, uses a multi-level stepped contraction ionization structure, and uses a magnetic confinement structure and a rotating magnetic field acceleration structure to accelerate the plasma. A multi-stage ionizing rotating magnetic field accelerates a helicon wave plasma source. Background technique [0002] The helicon wave plasma source is a device that can efficiently convert radio frequency wave energy into high-density plasma through an antenna system without electrode contact. It has a variety of propellants (oxygen-enriched gas or air), no electrodes (long life), high ionization rate (nearly 100% in the central area), high density (10 17 -10 20 m -3 ), low magnetic field confinement (<0.1T), high controllability (multi-mode operation), and other significant advantages, it is very suitab...

Claims

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Application Information

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IPC IPC(8): H05H1/30
CPCH05H1/30
Inventor 张尊汤海滨章喆
Owner BEIHANG UNIV
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