Sapphire polishing agent and preparation method thereof
A polishing agent and sapphire technology, which is applied to polishing compositions containing abrasives and other directions, can solve the problems of unstable polishing surface quality and low polishing rate of sapphire polishing liquid, and achieve the effects of good polishing effect and simple preparation method.
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[0018] Example 1
[0019] A sapphire polishing agent, comprising the following parts by mass: 80 parts of silicon, 34 parts of α-alumina, 22 parts of aluminum oxide, 22 parts of titanium dioxide, 16 parts of zirconia, 14 parts of disodium hydrogen phosphate, and chitosan 14 parts, 12 parts of ferric chloride, 8 parts of titanium diboride, 5 parts of carbon black, 3 parts of dispersant, and 120 parts of deionized water.
[0020] Wherein, the dispersant is an ethylene-acrylic acid copolymer.
[0021] A preparation method of sapphire polishing agent includes the following steps:
[0022] (1) Weigh the raw materials and reserve them;
[0023] (2) Ball milling silicon, α-alumina, aluminum oxide, titanium dioxide, zirconium oxide, ferric chloride, titanium diboride, and carbon black respectively for 1 hour and mixing uniformly to obtain a mixture;
[0024] (3) Dissolve the mixture in deionized water and stir for 1 hour at a temperature of 150°C at a speed of 600r / min; add disodium hydrogen ph...
Example Embodiment
[0025] Example 2
[0026] A sapphire polishing agent, comprising the following parts by mass: 120 parts of silicon, 44 parts of α-alumina, 35 parts of aluminum oxide, 34 parts of titanium dioxide, 21 parts of zirconia, 18 parts of disodium hydrogen phosphate, and chitosan 19 parts, 16 parts of ferric chloride, 14 parts of titanium diboride, 9 parts of carbon black, 5 parts of dispersant, and 150 parts of deionized water.
[0027] Wherein, the dispersant is ethylene-vinyl acetate copolymer.
[0028] A preparation method of sapphire polishing agent includes the following steps:
[0029] (1) Weigh the raw materials and reserve them;
[0030] (2) Ball milling silicon, α-alumina, aluminum oxide, titanium dioxide, zirconium oxide, ferric chloride, titanium diboride, and carbon black respectively for 2 hours and mixing uniformly to obtain a mixture;
[0031] (3) Dissolve the mixture in deionized water and stir for 2 hours at a temperature of 180°C at 1000r / min; add disodium hydrogen phosphate,...
Example Embodiment
[0032] Example 3
[0033] A sapphire polishing agent, comprising the following parts by mass: 110 parts of silicon, 42 parts of α-alumina, 30 parts of aluminum oxide, 29 parts of titanium dioxide, 19 parts of zirconia, 16 parts of disodium hydrogen phosphate, and chitosan 16 parts, 15 parts of ferric chloride, 12 parts of titanium diboride, 8 parts of carbon black, 4 parts of dispersant, and 130 parts of deionized water.
[0034] Wherein, the dispersant is a low molecular ionomer.
[0035] A preparation method of sapphire polishing agent includes the following steps:
[0036] (1) Weigh the raw materials and reserve them;
[0037] (2) Ball milling silicon, α-alumina, aluminum oxide, titanium dioxide, zirconium oxide, ferric chloride, titanium diboride and carbon black respectively for 1.5 hours and mixing uniformly to obtain a mixture;
[0038] (3) Dissolve the mixture in deionized water, stir at 700r / min for 1.5 hours at a temperature of 170°C; add disodium hydrogen phosphate, chitosan ...
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