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Standard template for nanometer measurement instrument calibration and preparation method thereof

A technology for measuring instruments and standard templates, applied in instruments, measuring devices, scanning probe microscopy, etc., to achieve great application value, improve the efficiency of calibration, and achieve the effect of good uniformity

Inactive Publication Date: 2020-01-03
XI AN JIAOTONG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a standard template for calibrating nano measuring instruments and its preparation method to solve the problem in the prior art that two different templates are needed to complete the calibration of the atomic force microscope

Method used

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  • Standard template for nanometer measurement instrument calibration and preparation method thereof

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Embodiment

[0036] Such as figure 1 As shown, the preparation method of the standard template for calibration of the nanometer measuring instrument of the present embodiment comprises the steps:

[0037] Step 1. Soak a 4-inch monocrystalline silicon wafer in acetone for 5 minutes and ultrasonically for 2 minutes, then perform the same operation in absolute ethanol to remove impurities on the surface of the monocrystalline silicon wafer, and then rinse it with deionized water. Put it into a vacuum drying oven for drying treatment.

[0038] Step 2, put the cleaned single crystal silicon wafer into the chamber of the atomic layer deposition equipment, and deposit a layer of Al on the surface of the single crystal silicon wafer by atomic layer deposition technology 2 o 3 Film 2 (i.e. to obtain said first structure), Al 2 o 3 The growth rate of film 2 is 0.1nm per cycle, by controlling the number of cycles, the Al 2 o 3 The thickness of the film can be precisely controlled at a certain h...

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Abstract

The invention relates to a standard template for nanometer measurement instrument calibration and a preparation method thereof. A layer of Al2O3 thin film is deposited on the surface of a substrate byusing an atomic layer deposition process; photoresist is spin-coated on the surface of the Al2O3 thin film and is dried; exposure operation is carried out on the photoresist in an electron beam direct writing mode, wherein an exposure pattern is a pattern of a calibration structure in an x direction and a y direction of the standard template for nano measurement instrument calibration; developingis carried out in a developing solution and then drying is performed; the residual photoresist on the developing position is removed; the Al2O3 thin film which is not covered by the photoresist is removed by adopting a corrosion method; the residual photoresist on the surface is removed; and drying is performed to obtain the standard template for nanometer measurement instrument calibration. By virtue of the standard template, nano-scale control of the three-dimensional precision of the calibration structure can be realized, and the problem in one-time calibration of an atomic force microscope in x, y and z axes can be solved, and the calibration efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of nanometrics, in particular to a standard template for calibrating a nanometric measuring instrument and a preparation method thereof. Background technique [0002] With the development of nanotechnology, the requirements for the size accuracy of nanometer measuring instruments to measure micro-nano structures are getting higher and higher, and the role of nanometer standard templates is also becoming more and more important. In order to achieve high-precision, high-efficiency, and high-accuracy measurements, it is necessary to use nanometer standard templates to regularly calibrate nanometer measuring instruments such as scanning electron microscopes, transmission electron microscopes, and atomic force microscopes. [0003] Atomic Force Microscope (AFM) is a nanometer measuring instrument that can realize true three-dimensional measurement of the surface of the sample to be tested. The resolution is at th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01Q40/02G01Q60/24
CPCG01Q40/02G01Q60/24
Inventor 杨亚威王琛英蒋庄德景蔚萱林启敬刘明张易军毛琦王松张雅馨
Owner XI AN JIAOTONG UNIV
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