Method for Reducing Surface Contamination of Ion Beam Polished Optical Components

A technology for optical components and surface contamination, used in optical surface grinders, grinding/polishing equipment, manufacturing tools, etc., can solve the problems of reduced transmittance, optical component contamination, black impurities, etc., to improve cleanliness, reduce Impurity elements, the effect of improving processing quality

Active Publication Date: 2021-07-23
CHINA WEAPON SCI ACADEMY NINGBO BRANCH
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Problems solved by technology

However, when ion beam polishing is used to etch and polish optical components, there will be certain pollution on the surface of optical components, and sometimes there will be black impurities. After polishing, due to the existence of impurities, its optical performance is mainly reduced in transmittance. , which seriously affects the later use

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  • Method for Reducing Surface Contamination of Ion Beam Polished Optical Components
  • Method for Reducing Surface Contamination of Ion Beam Polished Optical Components
  • Method for Reducing Surface Contamination of Ion Beam Polished Optical Components

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Embodiment Construction

[0026] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.

[0027] Such as Figure 1 to Figure 3 As shown, in the embodiment of the present invention, the optical element is placed in the ion beam polishing equipment and the optical element is subjected to ion beam polishing, the optical element after ion beam polishing is taken out from the vacuum chamber, and the sample with black impurities on the surface after contamination figure 1 shown.

[0028] The X-ray diffractometer (XRD) analysis method is used to detect and analyze the black impurity area on the surface of the optical element polished by the ion beam polishing equipment, so as to determine the source of the impurity element; figure 2 It is the microscopic surface of optical components, and its composition is as follows image 3 As shown, according to the analysis of the curve measured by XRD, it ca...

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Abstract

The invention relates to a method for reducing the surface pollution of ion beam polishing optical elements. 1) the outside of the clamp used for clamping the optical elements in the ion beam polishing equipment is pasted and sealed with high-temperature adhesive tape; 2) the optical elements are installed After the fixture, the surface of the optical element and the fixture is cleaned, then put into the sub-chamber of the ion beam polishing equipment, and finally the optical element is sent to the main chamber of the ion beam polishing equipment; 3) install the ion source, the ion source 4) Turn on the ion beam polishing equipment, start the ion source, use the Faraday cup to measure the ion beam current sent by the ion source, and wait for the ion source to run for a certain set time After t has stabilized, perform ion beam polishing on the optics. By adopting the method, the surface of the optical element is clean after ion beam processing, effectively suppressing pollution, and improving processing quality.

Description

technical field [0001] The invention relates to the technical field of precision manufacturing, in particular to a method for reducing contamination on the surface of an ion beam polishing optical element. Background technique [0002] Ion beam polishing is usually used for the final processing of ultra-precision optical components. It is a polishing technology with removal accuracy reaching the atomic level. It is considered to be the optical component modification technology with the highest processing accuracy and good modification effect. [0003] In the process of ion beam polishing, the ion beam with a certain energy and spatial distribution bombards the surface of the optical element, and the physical sputtering effect that occurs during the bombardment is used to remove the surface material of the optical element to achieve the purpose of correcting the surface shape error, and the processing accuracy reaches nanometers. class. The material removal mechanism of ion ...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24B13/00B24B1/00
CPCB24B1/00B24B13/00
Inventor 王大森李晓静聂凤明裴宁郭海林张旭
Owner CHINA WEAPON SCI ACADEMY NINGBO BRANCH
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