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Undulator and laser plasma x-ray source including same

A laser plasma and undulator technology, applied in the X-ray field, can solve the problems of low magnetic field strength, lack of stability, tunability, and large volume, and achieve the effect of high magnetic field strength, increased photon energy and photon output

Active Publication Date: 2021-08-24
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the magnetic field intensity generated by the existing permanent magnet-based undulator is generally around 1 Tesla (T), and the magnetic field intensity is relatively small; in addition, its period length is about 10 cm, and its length is about 1 to 2 meters. bigger
And the existing laser plasma X-ray source lacks stability and tunability

Method used

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  • Undulator and laser plasma x-ray source including same
  • Undulator and laser plasma x-ray source including same
  • Undulator and laser plasma x-ray source including same

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Embodiment Construction

[0030] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below through specific embodiments in conjunction with the accompanying drawings.

[0031] figure 1 is a schematic plan view of a laser plasma X-ray source according to a preferred embodiment of the present invention. Such as figure 1 As shown, the laser plasma X-ray source 1 includes a laser plasma device 11 , an undulator 12 and a long pulse laser 13 .

[0032] The laser plasma device 11 includes a femtosecond laser 111 and a nozzle 112, the nozzle 112 is used to eject supersonic high-density gas 113, the femtosecond laser emitted by the femtosecond laser 111 is focused on the high-density gas 113, and the high-density gas 113 Ionized into plasma and accelerated, so that a high-energy electron beam 114 is emitted from the high-density gas 113 and enters the undulator 12 .

[0033] The undulator 12 includes a doub...

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Abstract

The invention provides an undulator and a laser plasma X-ray source including the same, the undulator includes: a capacitive coil target, which includes a first electrode plate and a second electrode plate oppositely arranged, and the second electrode plate It has a through hole; a double wound coil, which includes a first coil and a second coil that are staggered and have the same winding direction, and the two ends of the first coil are electrically connected to the first electrode plate and the second electrode plate connected, the two ends of the second solenoid coil are electrically connected to the first electrode plate and the second electrode plate, wherein the current directions in the first solenoid coil and the second solenoid coil are opposite. The laser plasma X-ray source of the present invention has a compact structure, and the X-rays produced by it have high brightness, short wavelength, and adjustable wavelength and energy.

Description

technical field [0001] The invention relates to the field of X-rays, in particular to an undulator and a laser plasma X-ray source including the undulator. Background technique [0002] Laser plasma acceleration refers to the use of ultra-intense ultra-short pulse laser to interact with plasma to generate high-energy charged particles. Laser plasma acceleration has an ultra-high accelerating electric field gradient, and the electron beam it produces has the characteristics of femtosecond time scale, kiloampere (KA) strong beam current, and small emittance. It is used in new accelerators, radiation sources, national defense and industry especially Ultrafast X / γ-rays and other fields have broad application prospects and have attracted extensive attention from scientists at home and abroad. [0003] The undulator period length and peak magnetic field strength in laser plasma X-ray sources are related to the wavelength and brightness of the radiated light. The shorter the peri...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05G2/00
CPCH05G2/008
Inventor 谭军豪李毅飞朱常青陈黎明
Owner INST OF PHYSICS - CHINESE ACAD OF SCI