Supercharge Your Innovation With Domain-Expert AI Agents!

Sample structure, manufacturing method thereof and incident space angle calibration method

A technology of samples and nanostructures, which is used in measurement devices, instruments, scanning probe microscopy, etc., to achieve the effects of a wide range of applications, a simple preparation process, and a simple sample structure

Pending Publication Date: 2020-03-27
UNIV OF SCI & TECH OF CHINA
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of this, the present invention provides a sample structure and its manufacturing method, and an incident space angle calibration method to solve the problem in the prior art that there is no effective means for direct measurement and precise calibration of the incident light space angle

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sample structure, manufacturing method thereof and incident space angle calibration method
  • Sample structure, manufacturing method thereof and incident space angle calibration method
  • Sample structure, manufacturing method thereof and incident space angle calibration method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0038] The sample structure provided by the present invention is a sample structure used for calibrating the incident light angle of a scattering type SNOM system, especially a SNOM system with a reflective illumination mode, that is, used in the technical field of calibrating the SNOM incident light spatial angle, such as figure 1 shown, figure 1 A schematic diagram of a sample structure provided in an embodiment of the present inven...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Lengthaaaaaaaaaa
Widthaaaaaaaaaa
Lengthaaaaaaaaaa
Login to View More

Abstract

The invention provides a sample structure, a manufacturing method thereof, and an incident space angle calibration method. The sample structure comprises a substrate, a metal film located on the substrate, and a nanostructure located in or on the metal film. The sample is simple in structure, easy in manufacturing method. However, under the irradiation of inclined incident light, the generated near-field light field distribution can be detected by the SNOM, and has good response to the incident light space angle, and can be used for SNOM near-field light field imaging, so that the incident light space angle component is reversely deduced according to the SNOM near-field light field imaging measurement result, and the calibration of the incident light space angle of the SNOM equipment is realized. The calibration method is simple and easy to implement, the sample structure preparation process is simple, the calibration method can be used as a standard sample to calibrate the incident light space angles of scattering type scanning near-field optical microscopes built by different manufacturer models or laboratories, the application range is wide, and mass production can be achieved.

Description

technical field [0001] The invention belongs to the technical field of nano-optical measurement, and in particular relates to a sample structure, a preparation method thereof, and an incident space angle calibration method. Background technique [0002] Scattering Scanning Near-field Optical Microscopy (s-SNOM) is an optical super-resolution microscopy technique based on scanning probes, which is mainly used to characterize the micro area (micron-nanoscale) on the sample. Near-field light field distribution. The basic principle is: use the AFM probe to focus and illuminate the laser beam, and excite a nano-scale enhanced near-field signal area near the tip of the needle. When the tip is close to the sample surface, the near-field optical information will change accordingly due to the difference in the dielectric properties of different substances. By analyzing the collected scattered signals through the background suppression technology, the near-field light field imaging ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01Q60/18G01Q40/02G01Q30/20
CPCG01Q30/20G01Q40/02G01Q60/18
Inventor 温晓镭
Owner UNIV OF SCI & TECH OF CHINA
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More