Application of a Mold Flux in High Speed Continuous Casting Peritectic Steel
A technology of mold slag and peritectic, which is applied in the field of iron and steel smelting and continuous casting, can solve the problems that the liquid slag layer cannot lubricate the copper mold and the initial casting slab, and the thickness of the liquid slag layer is reduced, and achieves heat control effect and uniform, Effect of promoting crystallization ability and high crystallization rate
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0056] Ingredients: binary alkalinity 1.2, CaO 37.6%, SiO 2 31.4%, Al 2 o 3 1.5%, MgO1.5%, Fe 2 o 3 1.0%, MnO3.0%, Na 2 O12.0%, Li 2 O2.0%, F - 10%;
[0057] Preparation process: same as comparative example 1.
[0058] The main physical properties of mold flux are shown in Table 1.
Embodiment 2
[0060] Ingredients: binary alkalinity 1.3, CaO 39.0%, SiO 2 30.0%, Al 2 o 3 1.5%, MgO1.5%, Fe 2 o 3 1.0%, MnO3.0%, Na 2 O12.0%, Li 2 O2.0%, F - 10%;
[0061] Preparation process: same as Comparative Example 1.
[0062] The main physical properties of mold flux are shown in Table 1.
Embodiment 3
[0064] Ingredients: binary alkalinity 1.3, CaO38.2%, SiO 2 29.3%, Al 2 o 3 1.5%, MgO3.0%, Fe 2 o 3 1.0%, MnO3.0%, Na 2 O12.0%, Li 2 O2.0%, F - 10%;
[0065] Preparation process: same as Comparative Example 1.
[0066] The main physical properties of mold flux are shown in Table 1.
PUM
Property | Measurement | Unit |
---|---|---|
size | aaaaa | aaaaa |
size | aaaaa | aaaaa |
crystal size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com